SCHEMBL2605576

SCHEMBL2605576

CO[Si](OC)(O[Si](OC)(OC)c1cccc(N)c1)c1cccc(N)c1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.45
CYP3A4 P08684 3/20 0.45
CASP1 P29466 2/20 0.42
RECQL P46063 1/20 0.42
CYP19A1 P11511 1/20 0.38
TP53 P04637 1/20 0.37
CA12 O43570 1/20 0.35
CA1 P00915 1/20 0.35
CA2 P00918 1/20 0.35
CA7 P43166 1/20 0.35
CA9 Q16790 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
CA14 Q9ULX7 1/20 0.35
MAOB P27338 1/20 0.35
MAPT P10636 2/20 0.35
POLB P06746 1/20 0.35
HSP90AA1 P07900 1/20 0.35
ADRA2C P18825 1/20 0.35
MAOA P21397 1/20 0.34
MECP2 P51608 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2605577 0.93 ALDH1A1 (0.40) ALDH1A1CYP3A4CASP1RECQLCYP19A1
SCHEMBL30021520 0.92 ALDH1A1 (0.48) ALDH1A1CYP3A4CASP1RECQLCYP19A1
SCHEMBL112433 0.92 ALDH1A1 (0.48) ALDH1A1CYP3A4CASP1RECQLCYP19A1
SCHEMBL27258880 0.90 ALDH1A1 (0.47) ALDH1A1CYP3A4CASP1RECQLCYP19A1
Methyl Alcohol SCHEMBL11502054 0.88 ALDH1A1 (0.45) ALDH1A1CYP3A4CASP1RECQLCYP19A1
SCHEMBL20757275 0.86 ALDH1A1 (0.38) ALDH1A1CYP3A4CASP1RECQLCYP19A1
SCHEMBL16454970 0.84 CYP3A4 (0.36) ALDH1A1CYP3A4CASP1RECQLCYP19A1
SCHEMBL16451546 0.84 CYP3A4 (0.36) ALDH1A1CYP3A4CASP1RECQLCYP19A1
SCHEMBL18118897 0.81 ALDH1A1 (0.32) ALDH1A1CYP3A4CYP19A1
SCHEMBL16451544 0.80 CYP3A4 (0.33) ALDH1A1CYP3A4CYP19A1TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11640110-B2 Resin composition, method for producing heat-resistant resin film, and display device TORAY INDUSTRIES, INC. (JP) 2023-05-02 US disclosed
US-11640110-B2 Resin composition, method for producing heat-resistant resin film, and display device TORAY INDUSTRIES, INC. (JP) 2023-05-02 US disclosed
US-20210116810-A1 RESIN COMPOSITION, RESIN SHEET, CURED FILM, METHOD FOR PRODUCING CURED FILM, SEMICONDUCTOR DEVICE, AND DISPLAY DEVICE TORAY INDUSTRIES, INC. (JP) 2021-04-22 US disclosed
US-20200339754-A1 RESIN COMPOSITION FOR DISPLAY SUBSTRATE, RESIN FILM FOR DISPLAY SUBSTRATE AND LAMINATE BODY CONTAINING THIS, IMAGE DISPLAY DEVICE, ORGANIC EL DISPLAY, AND MANUFACTURING METHOD OF THESE TORAY INDUSTRIES, INC. (JP) 2020-10-29 US disclosed
US-20200192227-A1 RESIN COMPOSITION, METHOD FOR PRODUCING HEAT-RESISTANT RESIN FILM, AND DISPLAY DEVICE TORAY INDUSTRIES, INC. (JP) 2020-06-18 US disclosed
US-10613439-B2 Photosensitive colored resin composition TORAY INDUSTRIES, INC. (JP) 2020-04-07 US disclosed
WO-2019142703-A1 RESIN COMPOSITION FOR DISPLAY SUBSTRATE, RESIN FILM FOR DISPLAY SUBSTRATE AND LAMINATE BODY CONTAINING THIS, IMAGE DISPLAY DEVICE, ORGANIC EL DISPLAY, AND MANUFACTURING METHOD OF THESE 東レ株式会社 2019-07-25 WO disclosed
US-10197915-B2 Resin and photosensitive resin composition TORAY INDUSTRIES, INC. (JP) 2019-02-05 US disclosed
US-9897915-B2 Photosensitive resin composition, method for producing heat-resistant resin film and display device TORAY INDUSTRIES, INC. (JP) 2018-02-20 US disclosed
US-9897915-B2 Photosensitive resin composition, method for producing heat-resistant resin film and display device TORAY INDUSTRIES, INC. (JP) 2018-02-20 US disclosed
US-20150203631-A1 POLYAMIC ACID RESIN COMPOSITION, POLYIMIDE FILM USING SAME, AND METHOD FOR PRODUCING SAID POLYIMIDE FILM TORAY INDUSTRIES, INC. (JP) 2015-07-23 US disclosed
EP-2881417-A1 POLYAMIDE ACID RESIN COMPOSITION, POLYIMIDE FILM USING SAME, AND METHOD FOR PRODUCING SAID POLYIMIDE FILM Toray Industries, Inc. (JP) 2015-06-10 EP disclosed
EP-2832769-A1 POLYAMIDE ACID AND RESIN COMPOSITION CONTAINING SAME Toray Industries, Inc. (JP) 2015-02-04 EP disclosed
US-8709552-B2 Resin composition and display device using the same TORAY INDUSTRIES, INC. (JP) 2014-04-29 US disclosed
US-8158324-B2 Positive-type photosensitive resin composition TORAY INDUSTRIES, INC. (JP) 2012-04-17 US disclosed
US-20110284855-A1 RESIN COMPOSITION AND DISPLAY DEVICE USING THE SAME TORAY INDUSTRIES, INC. (JP) 2011-11-24 US disclosed
US-20100099041-A1 POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION TORAY INDUSTRIES, INC. (JP) 2010-04-22 US disclosed
US-7507518-B2 Photosensitive resin precursor composition TORAY INDUSTRIES, INC. (JP) 2009-03-24 US disclosed
US-7507518-B2 Photosensitive resin precursor composition TORAY INDUSTRIES, INC. (JP) 2009-03-24 US disclosed
US-7455948-B2 Photosensitive resin composition TORAY INDUSTRIES, INC. (JP) 2008-11-25 US disclosed