SCHEMBL26061822

SCHEMBL26061822

CC1(CCC(=O)O)OCC(COC(=O)C23CC4CC(CC(O)(C4)C2)C3)CO1

nearest known ligand 0.44

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ABL1 P00519 1/20 0.44
TSHR P16473 1/20 0.44
RIN1 Q13671 1/20 0.44
ALDH1A1 P00352 4/20 0.43
L3MBTL1 Q9Y468 2/20 0.43
POLB P06746 1/20 0.41
NPSR1 Q6W5P4 2/20 0.39
NPC1 O15118 5/20 0.39
RAB9A P51151 5/20 0.39
USP2 O75604 1/20 0.38
LMNA P02545 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.36
GAA P10253 1/20 0.36
HSD11B1 P28845 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26061816 0.87 ALDH1A1 (0.42) ABL1TSHRRIN1ALDH1A1L3MBTL1
SCHEMBL26061819 0.84 ALDH1A1 (0.45) ABL1TSHRRIN1ALDH1A1L3MBTL1
SCHEMBL26061825 0.83 ALDH1A1 (0.43) ABL1TSHRRIN1ALDH1A1L3MBTL1
SCHEMBL19601020 0.78 TSHR (0.47) ABL1TSHRRIN1ALDH1A1L3MBTL1
SCHEMBL26061891 0.77 ALDH1A1 (0.46) ABL1TSHRRIN1ALDH1A1L3MBTL1
SCHEMBL26062801 0.77 ABL1 (0.42) ABL1TSHRRIN1ALDH1A1L3MBTL1
SCHEMBL26062784 0.76 ALDH1A1 (0.43) ABL1TSHRRIN1ALDH1A1L3MBTL1
SCHEMBL26062816 0.75 ALDH1A1 (0.42) ABL1TSHRRIN1ALDH1A1L3MBTL1
SCHEMBL25497595 0.72 ALDH1A1 (0.33) ALDH1A1NPSR1
SCHEMBL21262949 0.71 NPSR1 (0.50) ABL1TSHRRIN1ALDH1A1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11739056-B2 Carboxylate, carboxylic acid generator, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-08-29 US disclosed
US-11739056-B2 Carboxylate, carboxylic acid generator, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-08-29 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11739056-B2 Carboxylate, carboxylic acid generator, resist composition and method for producing resist pattern CHRM1, CHRM2, SCO2 ABL1 1030/4885TSHR 636/4885RIN1 1182/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.