SCHEMBL2607702

SCHEMBL2607702

CCC(Oc1ccc(C(C)CC)cc1)OC1CCCCC1

nearest known ligand 0.45

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.42
KMT2A Q03164 3/20 0.41
TSHR P16473 1/20 0.39
SLC7A5 Q01650 1/20 0.39
NPSR1 Q6W5P4 1/20 0.37
MEN1 O00255 2/20 0.36
MITF O75030 1/20 0.36
KDM4E B2RXH2 1/20 0.36
GAA P10253 1/20 0.36
MAPT P10636 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.35
TDP1 Q9NUW8 1/20 0.34
HTT P42858 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15279319 0.91 ALDH1A1 (0.39) ALDH1A1KMT2ATSHRSLC7A5NPSR1
SCHEMBL16081316 0.89 ALDH1A1 (0.39) ALDH1A1KMT2ATSHRSLC7A5NPSR1
SCHEMBL18473443 0.88 SLC7A5 (0.40) ALDH1A1KMT2ATSHRSLC7A5NPSR1
SCHEMBL15945466 0.88 ALDH1A1 (0.38) ALDH1A1KMT2ATSHRSLC7A5NPSR1
SCHEMBL14667693 0.87 PDE4A (0.42) ALDH1A1KMT2ATSHRSLC7A5MEN1
SCHEMBL825446 0.87 ALDH1A1 (0.43) ALDH1A1KMT2ATSHRSLC7A5NPSR1
SCHEMBL18474088 0.87 SLC7A5 (0.41) ALDH1A1KMT2ATSHRSLC7A5NPSR1
SCHEMBL17175303 0.87 ALDH1A1 (0.39) ALDH1A1KMT2ATSHRSLC7A5NPSR1
SCHEMBL14461887 0.86 ALDH1A1 (0.50) ALDH1A1KMT2AMEN1
SCHEMBL16683116 0.86 ALDH1A1 (0.36) ALDH1A1KMT2ATSHRSLC7A5NPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9188862-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and, actinic ray-sensitive or radiation-sensitive film and pattern forming method, each using the same FUJIFILM CORPORATION (JP) 2015-11-17 US disclosed
US-20150147688-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-05-28 US disclosed
US-8877423-B2 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2014-11-04 US disclosed
US-20140295332-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME FUJIFILM CORPORATION (JP) 2014-10-02 US disclosed
US-20120094237-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2012-04-19 US disclosed