Known targets — ChEMBL curated mechanism
CACNA1CCACNA1DCACNA1FCACNA1SDRD2HTR1BHTR1DHTR1F
The experimentally established mechanism targets of Malic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 7/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.50 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.47 |
| ▸ | HPGD | P15428 | 1/20 | 0.46 |
| ▸ | TP53 | P04637 | 3/20 | 0.42 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.42 |
| ▸ | THRB | P10828 | 2/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.35 |
| ▸ | TET2 | Q6N021 | 3/20 | 0.34 |
| ▸ | TET3 | O43151 | 1/20 | 0.34 |
| ▸ | TET1 | Q8NFU7 | 1/20 | 0.34 |
| ▸ | OR51E2 | Q9H255 | 1/20 | 0.31 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.30 |
| ▸ | ATM | Q13315 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Malic Acid SCHEMBL261227 | 0.90 | TSHR (0.63) | TSHRALDH1A1CYP3A4SMN1; SMN2HPGD | |
| Aspartic Acid SCHEMBL28264636 | 0.83 | TSHR (0.49) | TSHRALDH1A1CYP3A4SMN1; SMN2HPGD | |
| Hydrogen Peroxide SCHEMBL28304846 | 0.83 | TSHR (0.71) | TSHRALDH1A1CYP3A4SMN1; SMN2HPGD | |
| Lactic Acid SCHEMBL27685519 | 0.82 | TSHR (0.55) | TSHRALDH1A1CYP3A4SMN1; SMN2HPGD | |
| Bicarbonate SCHEMBL27397663 | 0.81 | TSHR (0.68) | TSHRALDH1A1CYP3A4SMN1; SMN2HPGD | |
| SCHEMBL26117 | 0.81 | — | — | |
| SCHEMBL2851828 | 0.81 | TSHR (0.74) | TSHRALDH1A1CYP3A4SMN1; SMN2HPGD | |
| SCHEMBL27858215 | 0.80 | TSHR (0.57) | TSHRALDH1A1CYP3A4SMN1; SMN2HPGD | |
| Succinic Acid SCHEMBL27825760 | 0.80 | TSHR (0.61) | TSHRALDH1A1CYP3A4SMN1; SMN2HPGD | |
| Acrylic Acid SCHEMBL2973647 | 0.79 | TSHR (0.65) | TSHRALDH1A1CYP3A4SMN1; SMN2HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110007562-A | Photopolymerizable unsaturated-resin and photosensitive resin composition containing the photopolymerizable unsaturated-resin | 罗门哈斯电子材料韩国有限公司 | 2019-07-12 | — | — | CN | claimed |
| CN-103890659-A | Photopolymerizable unsaturated resin, photosensitive resin composition containing the same, and light-shielding spacer and liquid crystal display device prepared therefrom | ROHM & HAAS ELECT MAT | 2014-06-25 | — | — | CN | claimed |
| CN-102681344-A | Photosensitive resin composition, low dielectric constant light shielding layer and liquid crystal display apparatus using the same | ROHM & HAAS ELECT MAT | 2012-09-19 | — | — | CN | claimed |
| US-11667730-B2 | Oxime ester compound and photopolymerization initiator containing the same | ADEKA CORPORATION (JP) | 2023-06-06 | — | — | US | disclosed |
| EP-3339331-B1 | COMPOSITION | ADEKA CORP (JP) | 2022-02-16 | — | — | EP | disclosed |
| CN-106132929-B | Oxime ester compound and photopolymerization initiator containing the same | 株式会社艾迪科 | 2020-06-19 | — | — | CN | disclosed |
| EP-3176153-B1 | NOVEL POLYMERIZATION INITIATOR AND RADICALLY POLYMERIZABLE COMPOSITION CONTAINING SAME | ADEKA CORP (JP) | 2020-04-08 | — | — | EP | disclosed |
| US-10189847-B2 | Oxime ester compound and photopolymerization initiator containing said compound | ADEKA CORPORATION (JP) | 2019-01-29 | — | — | US | disclosed |
| CN-108699183-A | Composition and new compound | 株式会社艾迪科 | 2018-10-23 | — | — | CN | disclosed |
| CN-108473609-A | Photosensitive composite and new compound | 株式会社艾迪科 | 2018-08-31 | — | — | CN | disclosed |
| CN-108369831-A | Conductive paste | 株式会社艾迪科 | 2018-08-03 | — | — | CN | disclosed |
| EP-2145880-A1 | NOVEL EPOXY COMPOUND, ALKALI-DEVELOPABLE RESIN COMPOSITION, AND ALKALI-DEVELOPABLE PHOTOSENSITIVE RESIN COMPOSITION | Adeka Corporation (JP) | 2010-01-20 | — | — | EP | disclosed |
| CN-100580555-C | Alkaline developable resin composition | ADEKA CORP | 2010-01-13 | — | — | CN | disclosed |
| EP-2128132-A1 | OXIME ESTER COMPOUND AND PHOTOPOLYMERIZATION INITIATOR COMPRISING THE COMPOUND | Adeka Corporation (JP) | 2009-12-02 | — | — | EP | disclosed |
| US-20090292039-A1 | OXIME ESTER COMPOUND AND PHOTOPOLYMERIZATION INITIATOR CONTAINING THE SAME | ADEKA CORPORATION (JP) | 2009-11-26 | — | — | US | disclosed |
| EP-2072500-A1 | OXIME ESTER COMPOUND AND PHOTOPOLYMERIZATION INITIATOR CONTAINING THE COMPOUND | Adeka Corporation (JP) | 2009-06-24 | — | — | EP | disclosed |
| US-20070269720-A1 | Alkali-Developable, Colored Photosensitive Resin Composition and Color Filter Using The Alkali-Developable, Colored Photosensitive Resin Composition | TOPPAN PRINTING CO., LTD. (JP) | 2007-11-22 | — | — | US | disclosed |
| CN-101023394-A | Colored alkali developable photosensitive resin composition, and color filter using said colored alkali developable photosensitive resin compositoin | TOPPAN PRINTING CO LTD (JP) | 2007-08-22 | — | — | CN | disclosed |
| CN-1885162-A | Alkali developing photosensitive resin composition | ADEKA CORP (JP) | 2006-12-27 | — | — | CN | disclosed |
| CN-1860415-A | Alkali developable resin composition | ASAHI DENKA CO LTD (JP) | 2006-11-08 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11667730-B2 | Oxime ester compound and photopolymerization initiator containing the same | OXER1, CYP4A11, CYP4F11 | TSHR 344/4885ALDH1A1 2056/4885CYP3A4 27/4885 |
| US-10189847-B2 | Oxime ester compound and photopolymerization initiator containing said compound | PPOX, CCNO, MRTO4 | TSHR 2007/4885ALDH1A1 1193/4885CYP3A4 370/4885 |
| US-20090292039-A1 | OXIME ESTER COMPOUND AND PHOTOPOLYMERIZATION INITIATOR CONTAINING THE SAME | OXER1, CYP4A11, CYP4F11 | TSHR 429/4885ALDH1A1 2106/4885CYP3A4 32/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.