Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.44 |
| ▸ | CYP4F2 | P78329 | 2/20 | 0.40 |
| ▸ | CYP4A11 | Q02928 | 2/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.37 |
| ▸ | MEN1 | O00255 | 2/20 | 0.37 |
| ▸ | PKM | P14618 | 2/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 2/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | HTT | P42858 | 3/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | THRB | P10828 | 1/20 | 0.36 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.36 |
| ▸ | MGAM | O43451 | 1/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.36 |
| ▸ | SI | P14410 | 1/20 | 0.36 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2110889 | 0.98 | ALDH1A1 (0.43) | ALDH1A1L3MBTL1CYP4F2CYP4A11KMT2A | |
| SCHEMBL10134640 | 0.87 | GAA (0.39) | ALDH1A1L3MBTL1KMT2AKDM4ETSHR | |
| SCHEMBL16904908 | 0.84 | ALDH1A1 (0.39) | ALDH1A1L3MBTL1TSHR | |
| SCHEMBL2610390 | 0.83 | ALDH1A1 (0.41) | ALDH1A1L3MBTL1LMNATSHR | |
| SCHEMBL758493 | 0.83 | ALDH1A1 (0.39) | ALDH1A1CYP4F2CYP4A11KMT2AMEN1 | |
| SCHEMBL14294659 | 0.82 | ALDH1A1 (0.48) | ALDH1A1L3MBTL1 | |
| SCHEMBL14228089 | 0.82 | ALDH1A1 (0.48) | ALDH1A1L3MBTL1 | |
| SCHEMBL15858345 | 0.81 | CYP4F2 (0.39) | ALDH1A1CYP4F2CYP4A11KMT2AMEN1 | |
| SCHEMBL15783175 | 0.80 | ALDH1A1 (0.39) | ALDH1A1L3MBTL1HIF1A | |
| SCHEMBL17281288 | 0.80 | ALDH1A1 (0.45) | ALDH1A1L3MBTL1LMNATSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 106 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250034120-A1 | PYRIDAZINONES AS PARP7 INHIBITORS | RIBON THERAPEUTICS, INC. | 2025-01-30 | — | — | US | disclosed |
| US-11839476-B2 | Bio-electrode composition, bio-electrode, and method for manufacturing a bio-electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-12 | — | — | US | disclosed |
| US-11796916-B2 | Pattern formation methods and photoresist pattern overcoat compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2023-10-24 | — | — | US | disclosed |
| EP-4234551-A2 | PYRIDAZINONES AS PARP7 INHIBITORS | Ribon Therapeutics Inc. (US) | 2023-08-30 | — | — | EP | disclosed |
| US-20230192664-A1 | PYRIDAZINONES AS PARP7 INHIBITORS | ANKURA TRUST COMPANY, LLC, AS COLLATERAL TRUSTEE | 2023-06-22 | — | — | US | disclosed |
| EP-3788040-B1 | PYRIDAZINONES AS PARP7 INHIBITORS | RIBON THERAPEUTICS INC (US) | 2023-04-12 | — | — | EP | disclosed |
| US-11566020-B1 | Pyridazinones as PARP7 inhibitors | RIBON THERAPEUTICS, INC. (US) | 2023-01-31 | — | — | US | disclosed |
| US-11014913-B2 | Pyridazinones as PARP7 inhibitors | RIBON THERAPEUTICS, INC. (US) | 2021-05-25 | — | — | US | disclosed |
| EP-3788040-A1 | PYRIDAZINONES AS PARP7 INHIBITORS | Ribon Therapeutics Inc. (US) | 2021-03-10 | — | — | EP | disclosed |
| CN-112424188-A | Pyridazinones as PARP7 inhibitors | 里邦医疗公司 | 2021-02-26 | — | — | CN | disclosed |
| US-7572570-B2 | Using acrylic ester and sulfonium said salt; high resolution semiconductors; microfabrication patterns; excimer laser lithography | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-08-11 | — | — | US | disclosed |
| US-7566522-B2 | Having acrylic ester functionality with acid labile ester ring functionality and sulfonium sulfonate acid salt; high resolution semiconductor microfabrication patterns; excimer laser lithography | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-07-28 | — | — | US | disclosed |
| US-20080274426-A1 | Using acrylic ester and sulfonium said salt; high resolution semiconductors; microfabrication patterns; excimer laser lithography | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-11-06 | — | — | US | disclosed |
| US-7435526-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2008-10-14 | — | — | US | disclosed |
| US-20080248423-A1 | Lithography; semiconductor microfabrication | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-10-09 | — | — | US | disclosed |
| US-20080220369-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-09-11 | — | — | US | disclosed |
| US-20080213695-A1 | Lithography; semiconductor microfabrication | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-09-04 | — | — | US | disclosed |
| US-20080193874-A1 | Having acrylic ester functionality with acid labile ester ring functionality and sulfonium sulfonate acid salt; high resolution semiconductor microfabrication patterns; excimer laser lithography | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-08-14 | — | — | US | disclosed |
| US-20080166660-A1 | Having acrylic ester functionality with acid labile ester ring functionality and sulfonium sulfonate acid salt; high resolution semiconductor microfabrication patterns; excimer laser lithography | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-07-10 | — | — | US | disclosed |
| US-20080153030-A1 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-06-26 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20250034120-A1 | PYRIDAZINONES AS PARP7 INHIBITORS | PARP2, PARP1, PARP4 | ALDH1A1 1033/4885L3MBTL1 2933/4885CYP4F2 1930/4885 |
| US-11014913-B2 | Pyridazinones as PARP7 inhibitors | PARP2, PARP1, PARP4 | ALDH1A1 1033/4885L3MBTL1 2933/4885CYP4F2 1930/4885 |
| US-11839476-B2 | Bio-electrode composition, bio-electrode, and method for manufacturing a bio-electrode | AFF1, AFF4, AFF2 | ALDH1A1 256/4885L3MBTL1 3199/4885CYP4F2 25/4885 |
| US-11566020-B1 | Pyridazinones as PARP7 inhibitors | PARP2, PARP1, PARP4 | ALDH1A1 1033/4885L3MBTL1 2933/4885CYP4F2 1930/4885 |
| US-20230192664-A1 | PYRIDAZINONES AS PARP7 INHIBITORS | PARP2, PARP1, PARP4 | ALDH1A1 1033/4885L3MBTL1 2933/4885CYP4F2 1930/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.