Methacrylic Acid

Methacrylic Acid

SCHEMBL26112015

C=C(C)C(=O)O.C=C(C)C(=O)O.C=C(C)C(=O)O.CCCCCCCC(CO)(CO)CO

nearest known ligand 0.44

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 6/20 0.42
CES2 O00748 1/20 0.39
THRB P10828 1/20 0.39
FNTA P49354 1/20 0.39
FNTB P49356 1/20 0.39
PGGT1B P53609 1/20 0.39
GPR84 Q9NQS5 6/20 0.38
PPARG P37231 6/20 0.38
PPARD Q03181 6/20 0.38
PPARA Q07869 6/20 0.38
HDAC11 Q96DB2 5/20 0.38
ALDH1A1 P00352 2/20 0.38
TLR2 O60603 2/20 0.38
TDP1 Q9NUW8 2/20 0.38
FABP4 P15090 2/20 0.38
PTPN1 P18031 2/20 0.38
SLC22A6 Q4U2R8 1/20 0.38
SLC22A8 Q8TCC7 1/20 0.38
MEN1 O00255 1/20 0.38
ESR1 P03372 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL10400676 1.00 TSHR (0.42) TSHRCES2THRBFNTAFNTB
Methacrylic Acid SCHEMBL31533285 1.00 TSHR (0.42) TSHRCES2THRBFNTAFNTB
Methacrylic Acid SCHEMBL1626731 1.00 TSHR (0.42) TSHRCES2THRBFNTAFNTB
Methacrylic Acid SCHEMBL1624640 1.00 TSHR (0.42) TSHRCES2THRBFNTAFNTB
Methacrylic Acid SCHEMBL10401173 1.00 TSHR (0.42) TSHRCES2THRBFNTAFNTB
Methacrylic Acid SCHEMBL6426043 0.98 TSHR (0.39) TSHRCES2THRBFNTAFNTB
Methacrylic Acid SCHEMBL31533294 0.98 TSHR (0.39) TSHRCES2THRBFNTAFNTB
Methacrylic Acid SCHEMBL1625983 0.98 TSHR (0.39) TSHRCES2THRBFNTAFNTB
Methacrylic Acid SCHEMBL1624905 0.98 TSHR (0.39) TSHRCES2THRBFNTAFNTB
Methacrylic Acid SCHEMBL9183108 0.92 TSHR (0.36) TSHRTHRBFNTAFNTBPGGT1B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023189969-A1 RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN 日本ゼオン株式会社 2023-10-05 WO disclosed