Methacrylic Acid

Methacrylic Acid

SCHEMBL6426043

C=C(C)C(=O)O.C=C(C)C(=O)O.C=C(C)C(=O)O.CCCCCC(CO)(CO)CO

nearest known ligand 0.42

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 6/20 0.39
CES2 O00748 1/20 0.36
THRB P10828 1/20 0.36
FNTA P49354 1/20 0.36
FNTB P49356 1/20 0.36
PGGT1B P53609 1/20 0.36
AKR1B1 P15121 1/20 0.35
PPARG P37231 6/20 0.34
PPARD Q03181 6/20 0.34
PPARA Q07869 6/20 0.34
GPR84 Q9NQS5 5/20 0.34
HDAC11 Q96DB2 5/20 0.34
ALDH1A1 P00352 2/20 0.34
TLR2 O60603 2/20 0.34
TDP1 Q9NUW8 2/20 0.34
FABP4 P15090 2/20 0.34
PTPN1 P18031 2/20 0.34
SLC22A6 Q4U2R8 1/20 0.34
SLC22A8 Q8TCC7 1/20 0.34
MEN1 O00255 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL1624905 1.00 TSHR (0.39) TSHRCES2THRBFNTAFNTB
Methacrylic Acid SCHEMBL31533294 1.00 TSHR (0.39) TSHRCES2THRBFNTAFNTB
Methacrylic Acid SCHEMBL1625983 1.00 TSHR (0.39) TSHRCES2THRBFNTAFNTB
Methacrylic Acid SCHEMBL26112015 0.98 TSHR (0.42) TSHRCES2THRBFNTAFNTB
Methacrylic Acid SCHEMBL31533285 0.98 TSHR (0.42) TSHRCES2THRBFNTAFNTB
Methacrylic Acid SCHEMBL1624640 0.98 TSHR (0.42) TSHRCES2THRBFNTAFNTB
Methacrylic Acid SCHEMBL1626731 0.98 TSHR (0.42) TSHRCES2THRBFNTAFNTB
Methacrylic Acid SCHEMBL10401173 0.98 TSHR (0.42) TSHRCES2THRBFNTAFNTB
Methacrylic Acid SCHEMBL10400676 0.98 TSHR (0.42) TSHRCES2THRBFNTAFNTB
Methacrylic Acid SCHEMBL9183108 0.94 TSHR (0.36) TSHRTHRBFNTAFNTBPGGT1B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0164201-A1 Low-fuming flame-retardant electric wire and method of production thereof SUMITOMO ELECTRIC INDUSTRIES LIMITED (JP) 1985-12-11 EP claimed
US-20250155808-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN ZEON CORPORATION (JP) 2025-05-15 US disclosed
WO-2024143072-A1 COMPOSITION AND CURED PRODUCT 株式会社ADEKA 2024-07-04 WO disclosed
WO-2024070672-A1 RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN 日本ゼオン株式会社 2024-04-04 WO disclosed
WO-2023189969-A1 RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN 日本ゼオン株式会社 2023-10-05 WO disclosed
EP-3932906-B1 NOVEL COMPOUND, COMPOSITION CONTAINING SAID COMPOUND, AND CURED OBJECT ADEKA CORP (JP) 2023-07-12 EP disclosed
US-11667609-B2 Compound, composition containing said compound, self-healing material, surface coating agent, paint, adhesive, material for battery and cured product ADEKA CORPORATION (JP) 2023-06-06 US disclosed
US-20220153698-A1 NOVEL COMPOUND, COMPOSITION CONTAINING SAID COMPOUND, SELF-HEALING MATERIAL, SURFACE COATING AGENT, PAINT, ADHESIVE, MATERIAL FOR BATTERY AND CURED PRODUCT ADEKA CORPORATION (JP) 2022-05-19 US disclosed
EP-3932906-A1 NOVEL COMPOUND, COMPOSITION CONTAINING SAID COMPOUND, AND CURED OBJECT ADEKA CORPORATION (JP) 2022-01-05 EP disclosed
CN-113544120-A Novel compound, composition containing same, and cured product 株式会社ADEKA 2021-10-22 CN disclosed
US-6912370-B2 Dual sided image printing device and method RICOH COMPANY, LTD. (JP) 2005-06-28 US disclosed
US-20020064404-A1 Device and method for forming image, and image formation system RICOH COMPANY, LTD. (JP) 2002-05-30 US disclosed
US-4797341-A TONERS DISPERSED IN DIELECTRIC ALIPHATIC HYDROCARBON OR HALOGENATED HYDROCARBON RICOH CO., LTD. (JP) 1989-01-10 US disclosed
US-4634651-A NARROW PARTICLE SIZE DISTRIBUTION RICOH CO., LTD. (JP) 1987-01-06 US disclosed
EP-0164201-A1 Low-fuming flame-retardant electric wire and method of production thereof SUMITOMO ELECTRIC INDUSTRIES LIMITED (JP) 1985-12-11 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11667609-B2 Compound, composition containing said compound, self-healing material, surface coating agent, paint, adhesive, material for battery and cured product H1-0, H1-10, RAD51 TSHR 4534/4885CES2 2653/4885THRB 3173/4885
US-20220153698-A1 NOVEL COMPOUND, COMPOSITION CONTAINING SAID COMPOUND, SELF-HEALING MATERIAL, SURFACE COATING AGENT, PAINT, ADHESIVE, MATERIAL FOR BATTERY AND CURED PRODUCT H1-0, H1-10, RAD51 TSHR 4592/4885CES2 2260/4885THRB 3284/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.