Methacrylic Acid

Methacrylic Acid

SCHEMBL26112019

C=C(C)C(=O)O.C=C(C)C(=O)O.C=C(C)C(=O)O.OCCCCCCCCC(CO)CO

nearest known ligand 0.42

Full drug profile on Sugi Atlas →

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.42
GPR84 Q9NQS5 4/20 0.35
FFAR1 O14842 2/20 0.35
FFAR4 Q5NUL3 1/20 0.35
TGFBR1 P36897 1/20 0.35
ALDH1A1 P00352 2/20 0.33
GSTK1 Q9Y2Q3 1/20 0.32
FNTA P49354 1/20 0.32
FNTB P49356 1/20 0.32
KDM4E B2RXH2 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
PTPN1 P18031 1/20 0.30
HSD17B10 Q99714 1/20 0.30
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL10399538 1.00 LMNA (0.42) LMNAGPR84FFAR1FFAR4TGFBR1
Methacrylic Acid SCHEMBL9183114 1.00 LMNA (0.42) LMNAGPR84FFAR1FFAR4TGFBR1
Methacrylic Acid SCHEMBL6426046 1.00 LMNA (0.42) LMNAGPR84FFAR1FFAR4TGFBR1
Methacrylic Acid SCHEMBL25385447 0.98 LMNA (0.39) LMNAGPR84FFAR1FFAR4TGFBR1
Methacrylic Acid SCHEMBL2026803 0.98 LMNA (0.39) LMNAGPR84FFAR1FFAR4TGFBR1
Methacrylic Acid SCHEMBL2245831 0.98 LMNA (0.39) LMNAGPR84FFAR1FFAR4TGFBR1
1,6-Hexanediol SCHEMBL11057122 0.96 LMNA (0.38) LMNAGPR84FFAR1FFAR4TGFBR1
1,5-Pentanediol SCHEMBL10424573 0.96 LMNA (0.38) LMNAGPR84FFAR1FFAR4TGFBR1
1,6-Hexanediol SCHEMBL10861538 0.96 LMNA (0.38) LMNAGPR84FFAR1FFAR4TGFBR1
Methacrylic Acid SCHEMBL10588963 0.93 LMNA (0.44) LMNAGPR84FFAR1FFAR4TGFBR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023189969-A1 RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN 日本ゼオン株式会社 2023-10-05 WO disclosed