SCHEMBL26136751

SCHEMBL26136751

CCCCCCCCCCCC(=O)N[C@@H](CCC(=O)ON)C(=O)ON

nearest known ligand 0.61

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.61
NOD1 Q9Y239 9/20 0.55
POLB P06746 1/20 0.55
DNM1 Q05193 1/20 0.51
MEN1 O00255 1/20 0.49
FAAH O00519 1/20 0.49
MAPK1 P28482 1/20 0.49
PLA2G2C Q5R387 1/20 0.48
L3MBTL1 Q9Y468 1/20 0.47
SLC6A5 Q9Y345 1/20 0.45
PLA2G10 O15496 1/20 0.45
CPT2 P23786 1/20 0.44
CPT1A P50416 1/20 0.44
CPT1B Q92523 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27719306 0.84 SLC6A5 (0.63) KMT2ANOD1DNM1MEN1FAAH
SCHEMBL7761870 0.82 KMT2A (0.64) KMT2ANOD1POLBDNM1MEN1
SCHEMBL28083226 0.82 KMT2A (0.64) KMT2ANOD1POLBDNM1MEN1
SCHEMBL28083227 0.82 KMT2A (0.64) KMT2ANOD1POLBDNM1MEN1
SCHEMBL7208303 0.82 KMT2A (0.64) KMT2ANOD1POLBDNM1MEN1
SCHEMBL31681672 0.81 KMT2A (0.91) KMT2ANOD1POLBDNM1MEN1
SCHEMBL3766835 0.80 KMT2A (0.69) KMT2ANOD1POLBDNM1MEN1
SCHEMBL9801697 0.80 KMT2A (0.69) KMT2ANOD1POLBDNM1MEN1
SCHEMBL3766782 0.80 KMT2A (0.69) KMT2ANOD1POLBDNM1MEN1
SCHEMBL8526560 0.80 KMT2A (0.69) KMT2ANOD1POLBDNM1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024038717-A1 COSMETIC PREPARATION CONTAINING CROSSLINKED ORGANIC SILICON RESIN AND METHOD FOR PRODUCING SAME 信越化学工業株式会社 2024-02-22 WO disclosed
WO-2024004579-A1 DISPERSION AND COSMETIC CONTAINING SAME 信越化学工業株式会社 2024-01-04 WO disclosed
WO-2023214506-A1 ACTIVATOR COMPOSITION AND COSMETIC 信越化学工業株式会社 2023-11-09 WO disclosed
WO-2023195402-A1 COMPOSITE PARTICLES, METHOD FOR PRODUCING COMPOSITE PARTICLES, AND COSMETIC 信越化学工業株式会社 2023-10-12 WO disclosed