Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.73 |
| ▸ | LMNA | P02545 | 1/20 | 0.54 |
| ▸ | CNR2 | P34972 | 1/20 | 0.54 |
| ▸ | KMO | O15229 | 1/20 | 0.53 |
| ▸ | NPC1 | O15118 | 2/20 | 0.50 |
| ▸ | RAB9A | P51151 | 2/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.48 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.48 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27337977 | 0.88 | CNR2 (0.67) | TDP1LMNACNR2ALDH1A1 | |
| SCHEMBL21312288 | 0.87 | TDP1 (0.59) | TDP1LMNACNR2KMONPC1 | |
| SCHEMBL16724888 | 0.86 | CNR2 (0.65) | TDP1LMNACNR2NPC1RAB9A | |
| SCHEMBL15907642 | 0.86 | CNR2 (0.65) | TDP1LMNACNR2NPC1RAB9A | |
| SCHEMBL416566 | 0.86 | TDP1 (0.91) | TDP1LMNANPC1RAB9AALDH1A1 | |
| SCHEMBL223441 | 0.86 | TDP1 (1.00) | TDP1LMNAALDH1A1SMN1; SMN2 | |
| SCHEMBL21312111 | 0.85 | TDP1 (0.53) | TDP1LMNACNR2KMONPC1 | |
| SCHEMBL21312671 | 0.85 | TDP1 (0.53) | TDP1LMNACNR2KMONPC1 | |
| SCHEMBL212972 | 0.84 | TDP1 (0.69) | TDP1LMNA | |
| SCHEMBL15902429 | 0.84 | CNR2 (0.62) | TDP1LMNACNR2NPC1RAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240019782-A1 | Composition For Forming Metal Oxide Film, Patterning Process, And Method For Forming Metal Oxide Film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-18 | — | — | US | disclosed |
| US-20230274936-A1 | PLANARIZING AGENT FOR FORMING ORGANIC FILM, COMPOSITION FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-31 | — | — | US | disclosed |