SCHEMBL2620569

SCHEMBL2620569

COc1ccc(C(=O)c2ccc(CO)cc2)c(OC)c1OC

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 6/20 0.48
ALDH1A1 P00352 4/20 0.48
KDM4E B2RXH2 3/20 0.48
MAPK1 P28482 3/20 0.48
LMNA P02545 2/20 0.48
HSD17B10 Q99714 2/20 0.48
TDP1 Q9NUW8 2/20 0.48
HPGD P15428 2/20 0.48
CYP3A4 P08684 1/20 0.48
RECQL P46063 1/20 0.48
HTT P42858 1/20 0.46
NPSR1 Q6W5P4 1/20 0.46
PDE4D Q08499 2/20 0.46
NPC1 O15118 1/20 0.45
ALOX15 P16050 2/20 0.45
SMN1; SMN2 Q16637 1/20 0.45
KMT2A Q03164 2/20 0.43
PKM P14618 1/20 0.43
ABCG2 Q9UNQ0 1/20 0.42
MEN1 O00255 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12587770 0.88 MAPK1 (0.46) MAPTALDH1A1KDM4EMAPK1LMNA
SCHEMBL30023021 0.88 MAPT (0.48) MAPTALDH1A1KDM4EMAPK1LMNA
SCHEMBL30022921 0.85 PLK1 (0.46) MAPTALDH1A1KDM4EMAPK1LMNA
SCHEMBL26791643 0.83 MAPT (0.54) MAPTALDH1A1KDM4EMAPK1LMNA
SCHEMBL30023898 0.83 MAPT (0.54) MAPTALDH1A1KDM4EMAPK1LMNA
SCHEMBL13496615 0.83 NPC1 (0.66) MAPTALDH1A1KDM4EMAPK1LMNA
SCHEMBL2446110 0.81 MAPT (0.66) MAPTALDH1A1KDM4EMAPK1LMNA
SCHEMBL30023422 0.81 MAPT (0.66) MAPTALDH1A1KDM4EMAPK1LMNA
SCHEMBL9726919 0.80 MAPT (0.58) MAPTALDH1A1TDP1PDE4DNPC1
SCHEMBL30023148 0.79 MAPT (0.50) MAPTALDH1A1KDM4EMAPK1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9005876-B2 Positive photosensitive resin composition for spray coating and method for producing through electrode using the same SUMITOMO BAKELITE CO., LTD. (JP) 2015-04-14 US disclosed
US-20140113448-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION FOR SPRAY COATING AND METHOD FOR PRODUCING THROUGH ELECTRODE USING THE SAME SUMITOMO BAKELITE CO., LTD. (JP) 2014-04-24 US disclosed
US-8530119-B2 Positive photosensitive resin composition, cured film, protective film, interlayer insulating film, and semiconductor device and display element using the same SUMITOMO BAKELITE CO., LTD. (JP) 2013-09-10 US disclosed
US-20130108967-A1 METHOD FOR FORMING CURED FILM SUMITOMO BAKELITE CO., LTD. (JP) 2013-05-02 US disclosed
US-20120100484-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, PROTECTIVE FILM, INTERLAYER INSULATING FILM, AND SEMICONDUCTOR DEVICE AND DISPLAY ELEMENT USING THE SAME SUMITOMO BAKELITE CO., LTD. (JP) 2012-04-26 US disclosed
US-20110200937-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION FOR SPRAY COATING AND METHOD FOR PRODUCING THROUGH ELECTRODE USING THE SAME SUMITOMO BAKELITE CO., LTD. (JP) 2011-08-18 US disclosed