SCHEMBL2623622

SCHEMBL2623622

CC(COCC(C)OCC(C)OC(C)COP)OP

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2623619 1.00 TDP1 (0.33) TDP1
SCHEMBL2623637 0.92 MAPK1 (0.31)
SCHEMBL2623647 0.87 TDP1 (0.31) TDP1
SCHEMBL2623635 0.87 TDP1 (0.31) TDP1
SCHEMBL2623620 0.87 TDP1 (0.31) TDP1
SCHEMBL2623618 0.87 MAPK1 (0.33) TDP1
SCHEMBL2623621 0.87 MAPK1 (0.33) TDP1
SCHEMBL2623636 0.87 MAPK1 (0.33) TDP1
SCHEMBL2623625 0.87 TDP1 (0.40) TDP1
SCHEMBL2623643 0.87 TDP1 (0.40) TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8158981-B2 Radiation-sensitive composition, method of forming silica-based coating film, silica-based coating film, apparatus and member having silica-based coating film and photosensitizing agent for insulating film HITACHI CHEMICAL COMPANY, LTD. (JP) 2012-04-17 US disclosed
US-20100102321-A1 RADIATION-SENSITIVE COMPOSITION, METHOD OF FORMING SILICA-BASED COATING FILM, SILICA-BASED COATING FILM, APPARATUS AND MEMBER HAVING SILICA-BASED COATING FILM AND PHOTOSENSITIZING AGENT FOR INSULATING FILM HITACHI CHEMICAL COMPANY, LTD. (JP) 2010-04-29 US disclosed