SCHEMBL2623637

SCHEMBL2623637

CC(COCC(C)OC(C)COP)OP

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2623629 0.93 MAPK1 (0.35) MAPK1
SCHEMBL2623624 0.93 MAPK1 (0.35) MAPK1
SCHEMBL2623622 0.92 TDP1 (0.33)
SCHEMBL2623619 0.92 TDP1 (0.33)
SCHEMBL2623639 0.84 MAPK1 (0.40) MAPK1
SCHEMBL2623641 0.84 TDP1 (0.31)
SCHEMBL2623642 0.82 HSD17B10 (0.41) MAPK1
SCHEMBL2623601 0.82
SCHEMBL2623640 0.82
SCHEMBL2623616 0.77 TDP1 (0.53) MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8158981-B2 Radiation-sensitive composition, method of forming silica-based coating film, silica-based coating film, apparatus and member having silica-based coating film and photosensitizing agent for insulating film HITACHI CHEMICAL COMPANY, LTD. (JP) 2012-04-17 US disclosed
US-20100102321-A1 RADIATION-SENSITIVE COMPOSITION, METHOD OF FORMING SILICA-BASED COATING FILM, SILICA-BASED COATING FILM, APPARATUS AND MEMBER HAVING SILICA-BASED COATING FILM AND PHOTOSENSITIZING AGENT FOR INSULATING FILM HITACHI CHEMICAL COMPANY, LTD. (JP) 2010-04-29 US disclosed