SCHEMBL26290447

SCHEMBL26290447

CC1(C)Oc2ccc(C(=O)O)c(O)c2O1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SELL P14151 1/20 0.41
SELP P16109 1/20 0.41
ALDH1A1 P00352 5/20 0.40
MAPK1 P28482 1/20 0.39
KDM4E B2RXH2 2/20 0.38
HSD17B10 Q99714 2/20 0.38
HPGD P15428 2/20 0.38
MAPT P10636 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
LDHA P00338 1/20 0.36
GRM1 Q13255 1/20 0.35
TSHR P16473 3/20 0.34
CYP1A2 P05177 2/20 0.34
ALB P02768 1/20 0.34
MMP2 P08253 1/20 0.34
ACHE P22303 2/20 0.34
BCHE P06276 1/20 0.34
ODC1 P11926 1/20 0.34
PTPN1 P18031 1/20 0.34
BACE1 P56817 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10520286 0.83 ALDH1A1 (0.40) ALDH1A1MAPK1KDM4EHSD17B10HPGD
SCHEMBL31474116 0.81 ALDH1A1 (0.39) ALDH1A1MAPK1KDM4EHPGDTSHR
SCHEMBL26290448 0.79 SELL (0.41) SELLSELPALDH1A1MAPK1KDM4E
SCHEMBL4701885 0.79 TDP1 (0.41) ALDH1A1MAPK1KDM4EHSD17B10HPGD
SCHEMBL11205516 0.73 TSHR (0.38) ALDH1A1TSHRALOX15ALOX12
SCHEMBL5846456 0.73 TSHR (0.43) ALDH1A1KDM4EHPGDMAPTTDP1
SCHEMBL10520245 0.71 HAAO (0.38) ALDH1A1KDM4EHSD17B10HPGDMAPT
SCHEMBL31085036 0.71 ALDH1A1 (0.39) ALDH1A1KDM4EHSD17B10HPGDTDP1
SCHEMBL31003132 0.71 ALDH1A1 (0.39) ALDH1A1KDM4EHSD17B10HPGDTDP1
SCHEMBL21262192 0.68 KDM4E (0.45) SELLSELPALDH1A1MAPK1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230296984-A1 EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2023-09-21 US disclosed
US-20230296984-A1 EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2023-09-21 US disclosed