⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23059985 | 0.83 | SOS1 (0.31) | — | |
| SCHEMBL23559308 | 0.82 | TTR (0.36) | — | |
| SCHEMBL23559438 | 0.80 | TPMT (0.33) | — | |
| SCHEMBL23559265 | 0.79 | — | — | |
| SCHEMBL23559268 | 0.78 | CA12 (0.33) | — | |
| SCHEMBL23559442 | 0.77 | POLB (0.32) | — | |
| SCHEMBL23559448 | 0.77 | LMNA (0.46) | — | |
| SCHEMBL23559322 | 0.75 | HPGD (0.32) | — | |
| SCHEMBL23559358 | 0.75 | HPGD (0.34) | — | |
| SCHEMBL26938027 | 0.75 | CA12 (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230296981-A1 | RESIST MATERIAL AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-21 | — | — | US | disclosed |
| US-20230296981-A1 | RESIST MATERIAL AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-21 | — | — | US | disclosed |
| US-20230296980-A1 | RESIST MATERIAL AND PATTERN FORMING METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-21 | — | — | US | disclosed |