SCHEMBL26326216

SCHEMBL26326216

OCC(O)COc1ccc(C(c2ccc(OCC(O)CO)cc2)C(c2ccc(OCC(O)CO)cc2)c2ccc(OCC(O)CO)cc2)cc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AR P10275 1/20 0.53
TSHR P16473 3/20 0.50
MAPK1 P28482 1/20 0.50
MAPT P10636 3/20 0.46
LMNA P02545 2/20 0.46
POLB P06746 1/20 0.46
NPSR1 Q6W5P4 1/20 0.46
CYP1A2 P05177 3/20 0.44
KDM4E B2RXH2 3/20 0.44
ALDH1A1 P00352 1/20 0.44
AGTR1 P30556 1/20 0.44
ATM Q13315 1/20 0.43
HTT P42858 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
KMT2A Q03164 2/20 0.43
CYP2C19 P33261 2/20 0.42
MEN1 O00255 1/20 0.42
CYP2D6 P10635 1/20 0.42
CYP2C9 P11712 1/20 0.42
FGFR1 P11362 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26326569 0.93 SLC6A2 (0.51) ARTSHRMAPK1MAPTLMNA
SCHEMBL6228324 0.89 AR (0.61) ARTSHRMAPK1MAPTLMNA
SCHEMBL31213834 0.88 AR (0.53) ARTSHRMAPK1MAPTLMNA
SCHEMBL22509337 0.86 AR (0.42) ARTSHRMAPK1MAPTLMNA
SCHEMBL8541521 0.85 KMT2A (0.59) ARTSHRMAPK1MAPTLMNA
SCHEMBL15801265 0.85 KMT2A (0.59) ARTSHRMAPK1MAPTLMNA
SCHEMBL15801262 0.85 KMT2A (0.59) ARTSHRMAPK1MAPTLMNA
SCHEMBL8811629 0.83 AR (0.56) ARTSHRMAPK1MAPTLMNA
SCHEMBL5010945 0.83 AR (0.56) ARTSHRMAPK1MAPTLMNA
SCHEMBL17345251 0.83 TDP1 (0.47) ARTSHRMAPK1MAPTLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11768436-B2 Protective film forming composition having a diol structure NISSAN CHEMICAL CORPORATION (JP) 2023-09-26 US disclosed
US-11768436-B2 Protective film forming composition having a diol structure NISSAN CHEMICAL CORPORATION (JP) 2023-09-26 US disclosed