Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM1A | O60341 | 3/20 | 0.46 |
| ▸ | MEN1 | O00255 | 2/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.37 |
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.36 |
| ▸ | HTR2A | P28223 | 1/20 | 0.36 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.36 |
| ▸ | TMEM97 | Q5BJF2 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1867559 | 0.88 | SIGMAR1 (0.43) | KDM1AALDH1A1TP53SIGMAR1HTR2A | |
| SCHEMBL30387985 | 0.88 | SIGMAR1 (0.43) | KDM1AALDH1A1TP53SIGMAR1HTR2A | |
| SCHEMBL2619379 | 0.75 | HTR2A (0.41) | SIGMAR1HTR2A | |
| SCHEMBL30869312 | 0.75 | HTR2A (0.41) | SIGMAR1HTR2A | |
| SCHEMBL17014522 | 0.72 | SIGMAR1 (0.50) | KDM1ASIGMAR1AKR1B1TMEM97 | |
| SCHEMBL11197926 | 0.71 | KDM1A (0.51) | KDM1AMEN1KMT2ASIGMAR1AKR1B1 | |
| SCHEMBL4666807 | 0.70 | SIGMAR1 (0.48) | KDM1ASIGMAR1HTR2ATMEM97 | |
| SCHEMBL578812 | 0.69 | KDM1A (0.59) | KDM1AMEN1KMT2ATSHRTP53 | |
| SCHEMBL29556050 | 0.69 | KDM1A (0.59) | KDM1AMEN1KMT2ATSHRTP53 | |
| SCHEMBL24125124 | 0.69 | SIGMAR1 (0.41) | KDM1AALDH1A1TP53SIGMAR1HTR2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230350294-A1 | Negative Photosensitive Resin Composition, Patterning Process, Interlayer Insulating Film, Surface Protection Film, And Electronic Component | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-02 | — | — | US | disclosed |
| US-11768434-B2 | Polymer having a structure of polyamide, polyamide-imide, or polyimide, photosensitive resin composition, patterning process, photosensitive dry film, and protective film for electric and electronic parts | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-26 | — | — | US | disclosed |