SCHEMBL26340786

SCHEMBL26340786

CCCC[PH](C1=CC=CCC1)(c1ccccc1)c1ccc(-c2ccc([PH](CCCC)(c3ccccc3)c3ccccc3)cc2)cc1

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22201596 0.93
SCHEMBL19077694 0.85
SCHEMBL14781550 0.83
SCHEMBL21156490 0.79
SCHEMBL20859560 0.76
SCHEMBL129711 0.73 LTA4H (0.38)
SCHEMBL16362455 0.72
Iodide SCHEMBL23668714 0.72 LTA4H (0.36) POLB
Bromide SCHEMBL9389629 0.72 LTA4H (0.36)
Fluoride SCHEMBL28402422 0.72 LTA4H (0.36) POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230305405-A1 COMPOSITION FOR FORMING SILICON-CONTAINING METAL HARD MASK AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-28 US disclosed