SCHEMBL26343053

SCHEMBL26343053

CCC(CC)(OC(=O)c1ccccc1)C(F)(F)C(=O)O

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CYP2D6 P10635 2/20 0.50
▸ CYP1A2 P05177 1/20 0.50
▸ CYP2C19 P33261 1/20 0.50
▸ MAPK1 P28482 1/20 0.46
▸ HIF1A Q16665 1/20 0.46
▸ LMNA P02545 3/20 0.45
▸ TSHR P16473 3/20 0.43
▸ TDP1 Q9NUW8 5/20 0.42
▸ SLC6A3 Q01959 2/20 0.42
▸ HTR1A P08908 1/20 0.42
▸ SCN1A P35498 1/20 0.42
▸ SCN5A Q14524 1/20 0.42
▸ SCN2A Q99250 1/20 0.42
▸ SCN3A Q9NY46 1/20 0.42
▸ F2 P00734 1/20 0.41
▸ ALDH1A1 P00352 3/20 0.41
▸ HSD17B10 Q99714 1/20 0.41
▸ SMN1; SMN2 Q16637 3/20 0.40
▸ NPC1 O15118 2/20 0.40
▸ RAB9A P51151 2/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26343065 0.86 TRPV1 (0.40) CYP2D6CYP1A2CYP2C19LMNATSHR
SCHEMBL1785413 0.80 CYP2D6 (0.56) CYP2D6CYP1A2CYP2C19MAPK1HIF1A
SCHEMBL17799037 0.80 CYP2D6 (0.55) CYP2D6CYP1A2CYP2C19MAPK1HIF1A
SCHEMBL24360817 0.78 TSHR (0.49) CYP2D6CYP1A2CYP2C19MAPK1HIF1A
SCHEMBL15253427 0.76 CYP2D6 (0.55) CYP2D6CYP1A2CYP2C19MAPK1HIF1A
SCHEMBL1787582 0.75 CYP2D6 (0.51) CYP2D6CYP1A2CYP2C19MAPK1HIF1A
SCHEMBL24360983 0.74 CYP1A2 (0.47) CYP2D6CYP1A2CYP2C19MAPK1HIF1A
SCHEMBL24360887 0.74 MAPK1 (0.59) CYP2D6CYP1A2CYP2C19MAPK1HIF1A
SCHEMBL444728 0.74 CYP2D6 (0.61) CYP2D6CYP1A2CYP2C19MAPK1HIF1A
SCHEMBL3162941 0.74 CYP2D6 (0.57) CYP2D6CYP1A2CYP2C19MAPK1HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240027902-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 — — US disclosed
US-20230359119-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-09 — — US disclosed
US-20230305394-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-28 — — US disclosed
US-20230305393-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-28 — — US disclosed
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