SCHEMBL26343065

SCHEMBL26343065

CCC(CC)(OC(=O)c1ccc(I)cc1)C(F)(F)C(=O)O

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TRPV1 Q8NER1 3/20 0.40
▸ TPMT P51580 1/20 0.38
▸ CYP1A2 P05177 1/20 0.38
▸ CYP2D6 P10635 1/20 0.38
▸ CYP2C19 P33261 1/20 0.38
▸ PTPN2 P17706 2/20 0.35
▸ PTPN1 P18031 2/20 0.35
▸ PDK1 Q15118 1/20 0.35
▸ PDK2 Q15119 1/20 0.35
▸ PDK3 Q15120 1/20 0.35
▸ PDK4 Q16654 1/20 0.35
▸ POLB P06746 2/20 0.34
▸ RXRA P19793 1/20 0.34
▸ RXRB P28702 1/20 0.34
▸ CA1 P00915 1/20 0.33
▸ CA2 P00918 1/20 0.33
▸ MEN1 O00255 1/20 0.33
▸ TSHR P16473 1/20 0.33
▸ KMT2A Q03164 1/20 0.33
▸ LMNA P02545 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26343053 0.86 CYP2D6 (0.50) CYP1A2CYP2D6CYP2C19POLBTSHR
SCHEMBL23559559 0.80 TPMT (0.41) TRPV1TPMTCYP1A2CYP2D6CYP2C19
SCHEMBL24361407 0.77 TPMT (0.38) TRPV1TPMTCYP1A2CYP2D6CYP2C19
SCHEMBL26343076 0.75 HDAC3 (0.32) POLBHDAC1HDAC7HDAC8HDAC6
SCHEMBL26343085 0.74 TTR (0.36) MEN1KMT2A
SCHEMBL23559299 0.72 MAPK1 (0.47) TRPV1TPMTCYP2D6PTPN2PTPN1
SCHEMBL1560690 0.70 CA1 (0.53) TPMTPTPN2PTPN1CA1CA2
SCHEMBL24361840 0.70 TPMT (0.40) TRPV1TPMTPTPN2PTPN1POLB
SCHEMBL23382744 0.68 PPARA (0.40) TRPV1CYP1A2CYP2D6CYP2C19MEN1
SCHEMBL23382488 0.67 CA12 (0.46) CYP1A2CYP2D6CYP2C19CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240027902-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 — — US disclosed
US-20230359119-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-09 — — US disclosed
US-20230305394-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-28 — — US disclosed
US-20230305393-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-28 — — US disclosed
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