Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DTYMK | P23919 | 1/20 | 0.50 |
| ▸ | MEN1 | O00255 | 1/20 | 0.49 |
| ▸ | TTR | P02766 | 1/20 | 0.49 |
| ▸ | PPOX | P50336 | 1/20 | 0.49 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.49 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.49 |
| ▸ | ELANE | P08246 | 12/20 | 0.49 |
| ▸ | AKR1C3 | P42330 | 2/20 | 0.44 |
| ▸ | AKR1C2 | P52895 | 2/20 | 0.44 |
| ▸ | AKR1B10 | O60218 | 1/20 | 0.44 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.44 |
| ▸ | AKR1C4 | P17516 | 1/20 | 0.44 |
| ▸ | AKR1C1 | Q04828 | 1/20 | 0.44 |
| ▸ | TSHR | P16473 | 2/20 | 0.41 |
| ▸ | CASP6 | P55212 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11008714 | 0.84 | KDM4E (0.55) | DTYMKMEN1TTRPPOXKMT2A | |
| SCHEMBL26343189 | 0.83 | DTYMK (0.48) | DTYMKMEN1TTRPPOXKMT2A | |
| SCHEMBL26343222 | 0.82 | DTYMK (0.53) | DTYMKMEN1TTRPPOXKMT2A | |
| SCHEMBL6036166 | 0.81 | ELANE (0.47) | MEN1KMT2ATDP1ELANE | |
| SCHEMBL6164746 | 0.81 | ALDH1A1 (0.63) | DTYMKMEN1TTRPPOXKMT2A | |
| SCHEMBL269614 | 0.80 | AKR1C3 (0.63) | DTYMKMEN1TTRPPOXKMT2A | |
| SCHEMBL30580504 | 0.80 | AKR1C3 (0.63) | DTYMKMEN1TTRPPOXKMT2A | |
| SCHEMBL26343190 | 0.80 | DTYMK (0.50) | DTYMKMEN1TTRPPOXKMT2A | |
| SCHEMBL26343205 | 0.80 | DTYMK (0.50) | DTYMKMEN1TTRPPOXKMT2A | |
| SCHEMBL26343200 | 0.79 | MEN1 (0.44) | DTYMKMEN1TTRPPOXKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20230359119-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-09 | — | — | US | disclosed |
| US-20230305393-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230305394-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |