SCHEMBL263439

SCHEMBL263439

[SiH4].[SiH4]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28962129 1.00
SCHEMBL3295 1.00
SCHEMBL3294 1.00
SCHEMBL465227 1.00
SCHEMBL8089227 1.00
SCHEMBL10632871 1.00
SCHEMBL4352631 1.00
SCHEMBL131680 1.00
SCHEMBL8390528 1.00
SCHEMBL29402829 1.00

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 4003 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12637616-B2 Etching solution for selectively removing silicon-germanium alloy from a silicon-germanium/ silicon stack during manufacture of a semiconductor device VERSUM MATERIALS US, LLC (US) 2026-05-26 US claimed
WO-2025128253-A1 METHODS FOR REDUCING PHOTORESIST AND CARBON ETCH RATES IN AN ICP PROCESS CHAMBER USING A SILICON-BASED CHAMBER PRE-COAT APPLIED MATERIALS, INC. (US) 2025-06-19 WO claimed
US-20250201573-A1 METHODS FOR REDUCING PHOTORESIST AND CARBON ETCH RATES IN AN ICP PROCESS CHAMBER USING A SILICON-BASED CHAMBER PRE-COAT APPLIED MATERIALS, INC. 2025-06-19 US claimed
US-20250075317-A1 SYSTEMS AND METHODS FOR REMOVING COLLATERAL DEPOSITIONS FROM WITHIN CHAMBER ARRANGEMENTS IN SEMICONDUCTOR PROCESSING SYSTEMS ASM IP HOLDING B.V. (NL) 2025-03-06 US claimed
US-20240271040-A1 Etching Solution For Selectively Removing Silicon-Germanium Alloy From A Silicon-Germanium/ Silicon Stack During Manufacture Of A Semiconductor Device VERSUM MATERIALS US, LLC 2024-08-15 US claimed
WO-2024084163-A1 INFILTRATION OF A FIBROUS STRUCTURE COMPRISING A LIQUID SILICON ANTI-WETTING LAYER SAFRAN CERAMICS (FR) 2024-04-25 WO claimed
US-11946118-B2 Beta titanium alloy for additive manufacturing ALLOYED LIMITED (GB) 2024-04-02 US claimed
CN-117700963-A Modified core-shell polymer master batch toughening reinforced thermoplastic composite material and preparation method thereof 河南科高辐射化工科技有限公司 2024-03-15 CN claimed
EP-4323470-A1 ETCHING SOLUTION FOR SELECTIVELY REMOVING SILICON-GERMANIUM ALLOY FROM A SILICON-GERMANIUM/ SILICON STACK DURING MANUFACTURE OF A SEMICONDUCTOR DEVICE Versum Materials US, LLC (US) 2024-02-21 EP claimed
CN-115124901-B Corrosion-resistant capacitor coating and preparation method thereof 苏州皇冠涂料科技发展有限公司 2023-12-08 CN claimed
US-5589864-A Integrated varactor switches for acoustic ink printing XEROX CORPORATION (US) 1996-12-31 US claimed
US-5402747-A Method of growing crystal SUMITOMO METAL INDUSTRIES, LTD. (JP) 1995-04-04 US claimed
CN-2173986-Y Light energy-saving neon lamp transformer YU SHAOJIANG (CN) 1994-08-10 CN claimed
US-5231056-A Silane and dichlorosilane reactants MICRON TECHNOLOGY, INC. (US) 1993-07-27 US claimed
CN-1059473-A ELECTRONIC ACUPUNCTURAL CURATIVE INSTRUMENT FOR MYOPIA SHI YI (CN) 1992-03-18 CN claimed
CN-2086451-U ZERO-SEQUENCE CURRENT MUTUAL-INDUCTOR UNIV CHINA MINING (CN) 1991-10-09 CN claimed
CN-1042667-A Composite semipermeable membrane and manufacture method thereof SEPARATION DYNAMICS INC (US) 1990-06-06 CN claimed
CN-2055315-U Inductance electronic ballast ZHANG LIKUN (CN) 1990-03-28 CN claimed
US-4863531-A MOLECULAR ORIENTATION NIPPON STEEL CORPORATION (JP) 1989-09-05 US claimed
CN-2037658-U SEPARATEDLY-TAPPED ENERGY-SAVING ELECTRIC WELDER ENERGY SAVING ELECTRIC APPLIAN (CN) 1989-05-17 CN claimed