⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27192558 | 0.78 | — | — | |
| SCHEMBL1536174 | 0.77 | — | — | |
| SCHEMBL6563141 | 0.77 | — | — | |
| SCHEMBL3956238 | 0.75 | — | — | |
| SCHEMBL3948628 | 0.73 | — | — | |
| SCHEMBL1532592 | 0.73 | — | — | |
| SCHEMBL3946230 | 0.73 | — | — | |
| SCHEMBL6564206 | 0.72 | — | — | |
| SCHEMBL6562976 | 0.69 | — | — | |
| SCHEMBL6562417 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 78 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240027901-A1 | PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION USING SAME | SAN-APRO LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| EP-4261214-A1 | PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION USING SAME | San-Apro Ltd. (JP) | 2023-10-18 | — | — | EP | disclosed |
| WO-2022130796-A1 | PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION USING SAME | サンアプロ株式会社 | 2022-06-23 | — | — | WO | disclosed |
| US-11038145-B2 | Laminated film and process for manufacturing the same, as well as method for analyzing laminated film | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-06-15 | — | — | US | disclosed |
| EP-3135745-B1 | SEMICONDUCTOR NANOPARTICLE ASSEMBLY AND METHOD FOR PRODUCING SAME | KONICA MINOLTA INC (JP) | 2021-03-10 | — | — | EP | disclosed |
| US-10208245-B2 | Semiconductor nanoparticle assembly and method for manufacturing the same | Konica Minolta, Inc. (JP) | 2019-02-19 | — | — | US | disclosed |
| CN-106414063-B | Gas barrier film and electronic device using same | 柯尼卡美能达株式会社 | 2018-09-11 | — | — | CN | disclosed |
| US-20170288169-A1 | LAMINATED FILM AND PROCESS FOR MANUFACTURING THE SAME, AS WELL AS METHOD FOR ANALYZING LAMINATED FILM | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-10-05 | — | — | US | disclosed |
| US-20170288170-A1 | LAMINATED FILM AND PROCESS FOR MANUFACTURING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-10-05 | — | — | US | disclosed |
| US-20170210981-A1 | SEMICONDUCTOR NANOPARTICLE ASSEMBLY AND METHOD FOR MANUFACTURING THE SAME | Konica Minolta, Inc. (JP) | 2017-07-27 | — | — | US | disclosed |
| EP-1785266-A1 | GAS BARRIER MULTILAYER BODY AND METHOD FOR PRODUCING SAME | KONICA MINOLTA HOLDINGS, INC. (JP) | 2007-05-16 | — | — | EP | disclosed |
| US-20060216531-A1 | Laminate and method of forming the same, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2006-09-28 | — | — | US | disclosed |
| EP-1433809-B1 | Optical member having antireflection film | HOYA CORP (JP) | 2006-09-20 | — | — | EP | disclosed |
| EP-1679184-A1 | LAMINATE AND METHOD FOR FORMATION THEREOF, INSULATING FILM, SEMICONDUCTOR DEVICE, AND COMPOSITION FOR FORMING FILM | JSR Corporation (JP) | 2006-07-12 | — | — | EP | disclosed |
| US-20040146723-A1 | Optical element having antireflection film | HOYA CORPORATION (JP) | 2004-07-29 | — | — | US | disclosed |
| EP-1433809-A1 | Optical member having antireflection film | HOYA CORPORATION (JP) | 2004-06-30 | — | — | EP | disclosed |
| US-6506537-B2 | Photopolymerization | JSR CORPORATION (JP) | 2003-01-14 | — | — | US | disclosed |
| US-20020012872-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
| EP-1164433-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| US-5622784-A | WATERPROOFING; MODIFIED SILICON DIOXIDE THIN FILM | SEIKO EPSON CORPORATION (JP) | 1997-04-22 | — | — | US | disclosed |