SCHEMBL26426702

SCHEMBL26426702

C[N+](C)(C)CCOC(=O)c1cc(I)cc(I)c1I

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRM1 P11229 8/20 0.42
CHRM3 P20309 8/20 0.42
CHRM2 P08172 7/20 0.42
CHRM4 P08173 7/20 0.42
CHRM5 P08912 6/20 0.42
CHRNB2 P17787 4/20 0.42
CHRNA4 P43681 4/20 0.42
CHRNA7 P36544 3/20 0.42
HTR1A P08908 2/20 0.42
ADRA2A P08913 1/20 0.42
ADRA1A P35348 1/20 0.42
PGR P06401 1/20 0.42
TBXA2R P21731 1/20 0.42
CHRNB4 P30926 1/20 0.42
CHRNA3 P32297 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
CHRNA10 Q9GZZ6 1/20 0.42
CHRNA9 Q9UGM1 1/20 0.42
CYP2C19 P33261 2/20 0.41
GALR3 O60755 2/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26426703 0.87 CHRM1 (0.40) CHRM1CHRM3CHRM2CHRM4CHRNB2
SCHEMBL26426706 0.86 ESR1 (0.44) CHRM1CHRM3CHRM2CHRM4CHRM5
SCHEMBL26426704 0.85 ESR1 (0.40) LMNATSHRMAPK1L3MBTL1HDAC3
SCHEMBL26426705 0.83 ESR1 (0.44) LMNATSHRMAPK1L3MBTL1
SCHEMBL21705281 0.81 HDAC3 (0.43) TSHRHDAC3HDAC4HDAC1HDAC7
SCHEMBL22014240 0.80 TSHR (0.48) MAPTLMNATSHRGAAMAPK1
SCHEMBL21705781 0.80 HDAC3 (0.40) LMNATSHRMAPK1L3MBTL1HDAC3
SCHEMBL26426574 0.80 HDAC3 (0.38) CHRM3CHRM2CHRNA4SMN1; SMN2TSHR
SCHEMBL19678482 0.79 HDAC3 (0.42) TSHRL3MBTL1HDAC3HDAC4HDAC1
SCHEMBL26426571 0.79 HDAC3 (0.42) TSHRL3MBTL1HDAC3HDAC4HDAC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed