SCHEMBL26426776

SCHEMBL26426776

CC(C)(OC(=O)c1cc(I)cc(I)c1I)C1CN2CCC1C2

nearest known ligand 0.33

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
▸ CHRM1 P11229 1/20 0.31
▸ NTMT1 Q9BV86 1/20 0.30
▸ POLB P06746 1/20 0.30
▸ NLRP3 Q96P20 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22277824 0.78 SLC6A2 (0.33) —
SCHEMBL22277822 0.78 POLB (0.33) POLBNLRP3
SCHEMBL22277818 0.78 SLC6A2 (0.34) CHRM1
SCHEMBL22277451 0.77 ATM (0.33) CHRM1
SCHEMBL22277817 0.77 POLB (0.30) POLBNLRP3
SCHEMBL22945419 0.74 CHRNA7 (0.50) CHRM1
SCHEMBL26426778 0.74 POLB (0.32) POLBNLRP3
SCHEMBL22277450 0.74 MAPT (0.42) —
SCHEMBL22277441 0.73 POLB (0.30) POLBNLRP3
SCHEMBL22277446 0.73 POLB (0.31) POLBNLRP3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835859-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 — — US disclosed
US-20230129578-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 — — US disclosed
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