⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26426959 | 0.91 | — | — | |
| SCHEMBL26426969 | 0.90 | — | — | |
| SCHEMBL26426987 | 0.85 | — | — | |
| SCHEMBL26426994 | 0.85 | — | — | |
| SCHEMBL26427886 | 0.85 | — | — | |
| SCHEMBL24944346 | 0.80 | CHRNA7 (0.31) | — | |
| SCHEMBL24944339 | 0.77 | POLB (0.30) | — | |
| SCHEMBL26414374 | 0.77 | ALDH1A1 (0.35) | — | |
| SCHEMBL24944337 | 0.77 | KDM4E (0.31) | — | |
| SCHEMBL26426962 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230129578-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20230129578-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |