SCHEMBL26604686

SCHEMBL26604686

COC(=O)Cc1ccc(CCc2ccc3ccccc3c2)cc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP4F2 P78329 1/20 0.58
CYP4A11 Q02928 1/20 0.58
CYP1A2 P05177 1/20 0.50
POLB P06746 1/20 0.49
PPARG P37231 1/20 0.49
NCOA2 Q15596 1/20 0.49
NCOA1 Q15788 1/20 0.49
CTDSP1 Q9GZU7 1/20 0.49
NCOA3 Q9Y6Q9 1/20 0.49
MEN1 O00255 1/20 0.49
KMT2A Q03164 1/20 0.49
RPS6KB2 Q9UBS0 1/20 0.48
HDAC1 Q13547 1/20 0.48
HDAC8 Q9BY41 1/20 0.48
NR1H4 Q96RI1 1/20 0.47
GSK3A P49840 1/20 0.46
MAPK10 P53779 1/20 0.46
RIOK2 Q9BVS4 1/20 0.46
CES2 O00748 1/20 0.46
FFAR1 O14842 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31170867 0.90 MEN1 (0.57) CYP4F2CYP4A11MEN1KMT2ARPS6KB2
SCHEMBL2662328 0.90 MEN1 (0.57) CYP4F2CYP4A11MEN1KMT2ARPS6KB2
Hydrochloric Acid SCHEMBL5846666 0.89 MEN1 (0.56) CYP4F2CYP4A11POLBPPARGNCOA2
SCHEMBL18823048 0.88 CYP4F2 (0.50) CYP4F2CYP4A11POLBPPARGNCOA2
Cyclopropane SCHEMBL11849208 0.86 MEN1 (0.53) CYP4F2CYP4A11MEN1KMT2ARPS6KB2
SCHEMBL8980665 0.85 ALDH1A1 (0.53) CYP4F2CYP4A11MEN1KMT2ARPS6KB2
SCHEMBL6296732 0.84 CYP11B1 (0.54) CYP4F2CYP4A11POLBPPARGNCOA2
2-Naphthylacetic Acid SCHEMBL9315771 0.84 PTGS1 (0.62) CYP1A2MEN1KMT2ARPS6KB2NR1H4
SCHEMBL5348242 0.84 CYP1A2 (0.57) CYP1A2RPS6KB2HDAC1HDAC8FFAR1
SCHEMBL8427671 0.83 CYP4F2 (0.70) CYP4F2CYP4A11KMT2AHDAC1FFAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11796916-B2 Pattern formation methods and photoresist pattern overcoat compositions ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2023-10-24 US disclosed