SCHEMBL26705358

SCHEMBL26705358

CN1c2ccccc2C(C)(C)c2ccc(-c3ccc4c(c3)C(=O)c3ccccc3C4(C)C)cc21

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 8/20 0.41
▸ MEN1 O00255 7/20 0.41
▸ KMT2A Q03164 7/20 0.41
▸ HTT P42858 4/20 0.41
▸ USP2 O75604 3/20 0.41
▸ POLB P06746 2/20 0.41
▸ SMN1; SMN2 Q16637 2/20 0.41
▸ NPC1 O15118 1/20 0.41
▸ RAB9A P51151 1/20 0.41
▸ LMNA P02545 4/20 0.40
▸ PGR P06401 3/20 0.40
▸ TSHR P16473 2/20 0.39
▸ THRB P10828 2/20 0.39
▸ RECQL P46063 1/20 0.39
▸ BRD4 O60885 1/20 0.39
▸ CREBBP Q92793 1/20 0.39
▸ CHEK1 O14757 1/20 0.37
▸ TTR P02766 1/20 0.37
▸ CES1 P23141 1/20 0.37
▸ KDM4E B2RXH2 4/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26331351 0.86 MAPT (0.41) MAPTMEN1KMT2AHTTUSP2
SCHEMBL22172010 0.81 NPC1 (0.51) MAPTMEN1KMT2AHTTUSP2
SCHEMBL26503476 0.81 MEN1 (0.43) MAPTMEN1KMT2AHTTSMN1; SMN2
SCHEMBL19679550 0.81 HTT (0.44) MAPTMEN1KMT2AHTTUSP2
SCHEMBL12177813 0.81 MEN1 (0.42) MAPTMEN1KMT2AHTTSMN1; SMN2
SCHEMBL23056714 0.79 HTT (0.37) MAPTMEN1KMT2AHTTUSP2
SCHEMBL12177773 0.78 MEN1 (0.43) MAPTMEN1KMT2AHTTSMN1; SMN2
SCHEMBL26503478 0.77 GSTP1 (0.46) TSHR
SCHEMBL12177778 0.77 MEN1 (0.47) MAPTMEN1KMT2AHTTSMN1; SMN2
SCHEMBL26503480 0.77 GSTP1 (0.46) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230350294-A1 Negative Photosensitive Resin Composition, Patterning Process, Interlayer Insulating Film, Surface Protection Film, And Electronic Component SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-02 — — US disclosed
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