SCHEMBL2672207

SCHEMBL2672207

CN(C)C(=CCC[SiH3])N(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3104326 0.77
SCHEMBL358912 0.77
SCHEMBL15195836 0.74 TSHR (0.32)
SCHEMBL3119970 0.74
SCHEMBL4641972 0.70 TSHR (0.38)
SCHEMBL26918557 0.61
SCHEMBL2104078 0.59
SCHEMBL11108393 0.57 KDM4E (0.33)
SCHEMBL232019 0.57
SCHEMBL7751794 0.54

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3535302-B1 METHOD OF PRODUCING A MODIFIED DIENE-CONTAINING RUBBER, THE RUBBER AND A COMPOSITION BASED THEREON SIBUR HOLDING PUBLIC JOINT STOCK CO (RU) 2022-03-09 EP claimed
US-11124590-B2 Method of producing a modified diene-containing rubber, the rubber and a composition based thereon Public Joint Stock Company “SIBUR Holding” (RU) 2021-09-21 US claimed
US-20200262956-A1 METHOD OF PRODUCING A MODIFIED DIENE-CONTAINING RUBBER, THE RUBBER AND A COMPOSITION BASED THEREON PUBLIC JOINT STOCK COMPANY "SIBUR HOLDING" (RU) 2020-08-20 US claimed
EP-2463404-B1 METHOD FOR FORMING SIO2 FILM VERSUM MAT US LLC (US) 2019-10-23 EP claimed
EP-3535302-A1 METHOD OF PRODUCING A MODIFIED DIENE-CONTAINING RUBBER, THE RUBBER AND A COMPOSITION BASED THEREON Public Joint Stock Company "Sibur Holding" (RU) 2019-09-11 EP claimed
EP-2251899-B1 Dielectric barrier deposition using nitrogen containing precursor VERSUM MAT US LLC (US) 2018-03-28 EP claimed
US-8889235-B2 Dielectric barrier deposition using nitrogen containing precursor AIR PRODUCTS AND CHEMICALS, INC. (US) 2014-11-18 US claimed
US-20140065844-A1 Amino Vinylsilane Precursors for Stressed SiN Films VERSUM MATERIALS US, LLC 2014-03-06 US claimed
US-8460753-B2 Methods for depositing silicon dioxide or silicon oxide films using aminovinylsilanes AIR PRODUCTS AND CHEMICALS, INC. (US) 2013-06-11 US claimed
EP-2192207-B1 Method using amino vinylsilane precursors for the deposition of intrinsically compressively stressed SiN films AIR PROD & CHEM (US) 2012-06-20 EP claimed
US-20100291321-A1 Dielectric Barrier Deposition Using Nitrogen Containing Precursor AIR PRODUCTS AND CHEMICALS, INC. (US) 2010-11-18 US claimed
EP-2251899-A1 Dielectric barrier deposition using nitrogen containing precursor Air Products and Chemicals, Inc. (US) 2010-11-17 EP claimed
EP-3535302-B1 METHOD OF PRODUCING A MODIFIED DIENE-CONTAINING RUBBER, THE RUBBER AND A COMPOSITION BASED THEREON SIBUR HOLDING PUBLIC JOINT STOCK CO (RU) 2022-03-09 EP disclosed
US-11124590-B2 Method of producing a modified diene-containing rubber, the rubber and a composition based thereon Public Joint Stock Company “SIBUR Holding” (RU) 2021-09-21 US disclosed
US-20200262956-A1 METHOD OF PRODUCING A MODIFIED DIENE-CONTAINING RUBBER, THE RUBBER AND A COMPOSITION BASED THEREON PUBLIC JOINT STOCK COMPANY "SIBUR HOLDING" (RU) 2020-08-20 US disclosed
EP-2463404-B1 METHOD FOR FORMING SIO2 FILM VERSUM MAT US LLC (US) 2019-10-23 EP disclosed
US-20050192708-A1 Method for selecting formulations to treat electrical cables NOVINIUM, INC. (US) 2005-09-01 US disclosed
US-6506537-B2 Photopolymerization JSR CORPORATION (JP) 2003-01-14 US disclosed
US-20020012872-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-01-31 US disclosed
EP-1164433-A1 Radiation-sensitive resin composition JSR Corporation (JP) 2001-12-19 EP disclosed