⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3116974 | 0.79 | ABCB11 (0.38) | — | |
| SCHEMBL3104326 | 0.78 | — | — | |
| SCHEMBL2672207 | 0.74 | — | — | |
| SCHEMBL2100143 | 0.67 | EHMT2 (0.35) | — | |
| SCHEMBL2167597 | 0.66 | EHMT2 (0.38) | — | |
| SCHEMBL16752024 | 0.62 | TSHR (0.33) | — | |
| SCHEMBL31499119 | 0.61 | EHMT2 (0.35) | — | |
| SCHEMBL19049996 | 0.60 | CA12 (0.33) | — | |
| SCHEMBL26918557 | 0.58 | — | — | |
| SCHEMBL3119127 | 0.56 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3535302-B1 | METHOD OF PRODUCING A MODIFIED DIENE-CONTAINING RUBBER, THE RUBBER AND A COMPOSITION BASED THEREON | SIBUR HOLDING PUBLIC JOINT STOCK CO (RU) | 2022-03-09 | — | — | EP | claimed |
| US-11124590-B2 | Method of producing a modified diene-containing rubber, the rubber and a composition based thereon | Public Joint Stock Company “SIBUR Holding” (RU) | 2021-09-21 | — | — | US | claimed |
| US-20200262956-A1 | METHOD OF PRODUCING A MODIFIED DIENE-CONTAINING RUBBER, THE RUBBER AND A COMPOSITION BASED THEREON | PUBLIC JOINT STOCK COMPANY "SIBUR HOLDING" (RU) | 2020-08-20 | — | — | US | claimed |
| EP-2463404-B1 | METHOD FOR FORMING SIO2 FILM | VERSUM MAT US LLC (US) | 2019-10-23 | — | — | EP | claimed |
| EP-3535302-A1 | METHOD OF PRODUCING A MODIFIED DIENE-CONTAINING RUBBER, THE RUBBER AND A COMPOSITION BASED THEREON | Public Joint Stock Company "Sibur Holding" (RU) | 2019-09-11 | — | — | EP | claimed |
| EP-2251899-B1 | Dielectric barrier deposition using nitrogen containing precursor | VERSUM MAT US LLC (US) | 2018-03-28 | — | — | EP | claimed |
| US-8889235-B2 | Dielectric barrier deposition using nitrogen containing precursor | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2014-11-18 | — | — | US | claimed |
| US-20140065844-A1 | Amino Vinylsilane Precursors for Stressed SiN Films | VERSUM MATERIALS US, LLC | 2014-03-06 | — | — | US | claimed |
| US-8460753-B2 | Methods for depositing silicon dioxide or silicon oxide films using aminovinylsilanes | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-06-11 | — | — | US | claimed |
| EP-2192207-B1 | Method using amino vinylsilane precursors for the deposition of intrinsically compressively stressed SiN films | AIR PROD & CHEM (US) | 2012-06-20 | — | — | EP | claimed |
| US-20100291321-A1 | Dielectric Barrier Deposition Using Nitrogen Containing Precursor | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-11-18 | — | — | US | claimed |
| EP-2251899-A1 | Dielectric barrier deposition using nitrogen containing precursor | Air Products and Chemicals, Inc. (US) | 2010-11-17 | — | — | EP | claimed |
| EP-3535302-B1 | METHOD OF PRODUCING A MODIFIED DIENE-CONTAINING RUBBER, THE RUBBER AND A COMPOSITION BASED THEREON | SIBUR HOLDING PUBLIC JOINT STOCK CO (RU) | 2022-03-09 | — | — | EP | disclosed |
| US-11124590-B2 | Method of producing a modified diene-containing rubber, the rubber and a composition based thereon | Public Joint Stock Company “SIBUR Holding” (RU) | 2021-09-21 | — | — | US | disclosed |
| US-20200262956-A1 | METHOD OF PRODUCING A MODIFIED DIENE-CONTAINING RUBBER, THE RUBBER AND A COMPOSITION BASED THEREON | PUBLIC JOINT STOCK COMPANY "SIBUR HOLDING" (RU) | 2020-08-20 | — | — | US | disclosed |
| EP-2463404-B1 | METHOD FOR FORMING SIO2 FILM | VERSUM MAT US LLC (US) | 2019-10-23 | — | — | EP | disclosed |
| US-20100291321-A1 | Dielectric Barrier Deposition Using Nitrogen Containing Precursor | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-11-18 | — | — | US | disclosed |
| EP-2251899-A1 | Dielectric barrier deposition using nitrogen containing precursor | Air Products and Chemicals, Inc. (US) | 2010-11-17 | — | — | EP | disclosed |
| EP-2192207-A1 | Amino vinylsilane precursors for the deposition of intrinsically compressively stressed SiN films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-06-02 | — | — | EP | disclosed |
| US-20100120262-A1 | Amino Vinylsilane Precursors for Stressed SiN Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2010-05-13 | — | — | US | disclosed |