SCHEMBL2673276

SCHEMBL2673276

OCc1ccccc1-n1nc2ccccc2n1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 3/20 0.44
RAB9A P51151 3/20 0.44
KDM4E B2RXH2 7/20 0.43
HPGD P15428 6/20 0.43
LMNA P02545 1/20 0.43
ALDH1A1 P00352 6/20 0.39
MAPT P10636 4/20 0.39
HSD17B10 Q99714 3/20 0.39
ALOX15 P16050 2/20 0.39
MEN1 O00255 1/20 0.39
APAF1 O14727 1/20 0.39
TP53 P04637 1/20 0.39
CASP1 P29466 1/20 0.39
CASP7 P55210 1/20 0.39
KMT2A Q03164 1/20 0.39
APOBEC3G Q9HC16 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.36
NPSR1 Q6W5P4 2/20 0.36
POLB P06746 4/20 0.36
ABL1 P00519 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30037547 1.00 NPC1 (0.44) NPC1RAB9AKDM4EHPGDLMNA
SCHEMBL2223774 0.85 NPC1 (0.43) NPC1RAB9AKDM4EHPGDLMNA
SCHEMBL19752778 0.85 KDM4E (0.42) NPC1RAB9AKDM4EHPGDLMNA
SCHEMBL11296811 0.85 KDM4E (0.41) NPC1RAB9AKDM4EHPGDLMNA
SCHEMBL13385738 0.83 KDM4E (0.46) NPC1RAB9AKDM4EHPGDLMNA
SCHEMBL28927759 0.79 NPC1 (0.59) NPC1RAB9AKDM4EHPGDLMNA
SCHEMBL2023861 0.78 KDM4E (0.39) NPC1RAB9AKDM4EHPGDLMNA
SCHEMBL9175550 0.76 NPC1 (0.44) NPC1RAB9AKDM4EHPGDLMNA
SCHEMBL28802242 0.74 NPC1 (0.38) NPC1RAB9AKDM4EHPGDLMNA
SCHEMBL30027264 0.74 NR1H2 (0.45) NPC1RAB9AKDM4EHPGDLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100222473-A1 PHOTOSENSITIVE RESIN COMPOSITION DONGJIN SEMICHEM CO., LTD. (KR) 2010-09-02 US claimed
US-12522726-B2 Composite resin composition for automobile interior materials and automobile interior material manufactured using the same LG CHEM, LTD. (KR) 2026-01-13 US disclosed
US-20250188271-A1 COMPOSITE RESIN COMPOSITION FOR AUTOMOBILE INTERIOR MATERIALS AND AUTOMOBILE INTERIOR MATERIAL MANUFACTURED USING THE SAME LG CHEM, LTD. (KR) 2025-06-12 US disclosed
EP-4324613-B1 POLYMER COMPOSITION FOR BLOW MOLDING INCLUDING WASTE SEPARATOR WITH INORGANIC COATING AND MOLDED ARTICLE MANUFACTURED THEREFROM SK INNOVATION CO LTD (KR) 2025-04-23 EP disclosed
US-12258464-B2 Polymer composition for blow molding including waste separator with inorganic coating and molded article manufactured therefrom SK INNOVATION CO., LTD. (KR) 2025-03-25 US disclosed
US-20250002702-A1 COMPOSITE RESIN COMPOSITION FOR AUTOMOBILE INTERIOR MATERIALS AND AUTOMOBILE INTERIOR MATERIAL MANUFACTURED USING THE SAME LG CHEM, LTD. (KR) 2025-01-02 US disclosed
US-12129366-B2 Recycled polymer composition for manufacturing small to medium- sized container including HDPE recovered from secondary battery separator and small to medium-sized container manufactured therefrom SK INNOVATION CO., LTD. (KR) 2024-10-29 US disclosed
CN-117586569-A Polymer composition for hollow molding comprising inorganic-coated waste separator and molded article produced therefrom SK新技术株式会社 2024-02-23 CN disclosed
US-20240059879-A1 Polymer Composition for Blow Molding Including Waste Separator with Inorganic Coating and Molded Article Manufactured Therefrom SK GEO CENTRIC CO., LTD. (KR) 2024-02-22 US disclosed
US-20240059878-A1 Recycled Polymer Composition for Manufacturing Small to Medium-Sized Container Including HDPE Recovered from Secondary Battery Separator and Small to Medium-Sized Container Manufactured Therefrom SK GEO CENTRIC CO., LTD. (KR) 2024-02-22 US disclosed
CN-103080269-B Photochromic composition TOKUYAMA CORP. (JP) 2015-12-16 CN disclosed
CN-103351349-B Synthetic method for benzotriazole ultraviolet absorbent UV-P TIANCHANG TIANJIA CHEMICAL TECHNOLOGY CO LTD 2015-02-04 CN disclosed
CN-103351349-A Synthetic method for benzotriazole ultraviolet absorbent UV-P TIANCHANG TIANJIA CHEMICAL TECHNOLOGY CO LTD 2013-10-16 CN disclosed
EP-1666525-B1 NUCLEATING AGENT COMPOSITION AND CRYSTALLINE POLYMER COMPOSITIONS CONTAINING THE SAME ADEKA CORP (JP) 2013-05-08 EP disclosed
US-8173729-B2 Photosensitive resin composition DONGJIN SEMICHEM CO., LTD. (KR) 2012-05-08 US disclosed
US-20100222473-A1 PHOTOSENSITIVE RESIN COMPOSITION DONGJIN SEMICHEM CO., LTD. (KR) 2010-09-02 US disclosed
US-7442735-B2 Nucleating agent composition and crystalline polymer compositions containing the same ASAHI DENKA CO., LTD. (JP) 2008-10-28 US disclosed
US-20070054996-A1 Nucleating agent composition and crystalline polymer compositions containing the same ASAHI DENKA CO., LTD. (JP) 2007-03-08 US disclosed
EP-1666525-A1 NUCLEATING AGENT COMPOSITION AND CRYSTALLINE POLYMER COMPOSITIONS CONTAINING THE SAME Asahi Denka Co., Ltd. (JP) 2006-06-07 EP disclosed
US-5262541-A Reaction with sugar as a reducing agent FAIRMONT CHEMICAL COMPANY, INC. (US) 1993-11-16 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070054996-A1 Nucleating agent composition and crystalline polymer compositions containing the same NAF1, RCC1, RAN NPC1 234/4885RAB9A 3140/4885KDM4E 4408/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.