⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18470420 | 0.90 | NPSR1 (0.30) | — | |
| SCHEMBL22317808 | 0.89 | — | — | |
| SCHEMBL23519202 | 0.83 | NPSR1 (0.31) | — | |
| SCHEMBL26619873 | 0.82 | NPSR1 (0.32) | — | |
| SCHEMBL18573180 | 0.82 | — | — | |
| SCHEMBL19335787 | 0.82 | NPSR1 (0.31) | — | |
| SCHEMBL22336436 | 0.81 | NPSR1 (0.31) | — | |
| SCHEMBL20342010 | 0.81 | NPSR1 (0.31) | — | |
| SCHEMBL18470657 | 0.80 | NPSR1 (0.30) | — | |
| SCHEMBL19976010 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230367214-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-16 | — | — | US | disclosed |