SCHEMBL2679653

SCHEMBL2679653

[c]1[c]cc2cc[c]cc2c1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL129202 0.87
SCHEMBL71297 0.84
SCHEMBL6538069 0.83
SCHEMBL1091 0.77 CYP2A6 (0.47)
SCHEMBL14796756 0.77 CYP2A6 (0.47)
Water SCHEMBL27894314 0.77 CYP2A6 (0.47)
SCHEMBL8588369 0.74 CYP2A6 (0.44)
SCHEMBL11505201 0.74 CYP2A6 (0.44)
SCHEMBL27432717 0.74 CYP2A6 (0.44)
Water SCHEMBL27744164 0.74 CYP2A6 (0.44)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111417700-B Polymerizable liquid crystal composition, liquid crystal display element, and polymerizable compound DIC株式会社 2024-01-30 CN claimed
CN-111417700-A Polymerizable liquid crystal composition, liquid crystal display element, and polymerizable compound DIC株式会社 2020-07-14 CN claimed
US-9719018-B2 Monomer, liquid crystal composition, liquid crystal display device, and production method for liquid crystal display device SHARP KABUSHIKI KAISHA (JP) 2017-08-01 US claimed
US-20240122065-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN TOSOH CORPORATION (JP) 2024-04-11 US disclosed
CN-111417700-B Polymerizable liquid crystal composition, liquid crystal display element, and polymerizable compound DIC株式会社 2024-01-30 CN disclosed
WO-2023162653-A1 RESIST UNDERLAYER FILM FORMATION COMPOSITION 日産化学株式会社 2023-08-31 WO disclosed
EP-4198163-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN Tosoh Corporation (JP) 2023-06-21 EP disclosed
CN-116157382-A Material for metal patterning, amine compound, electronic device, and method for forming metal pattern 东曹株式会社 2023-05-23 CN disclosed
WO-2023013697-A1 MATERIAL FOR METAL PATTERNING, FLUORO COMPOUND, THIN FILM FOR METAL PATTERNING, ORGANIC ELECTROLUMINESCENCE DEVICE, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN 東ソー株式会社 2023-02-09 WO disclosed
US-11326024-B2 Polyamide resin, molded body, laminate, medical device, and polyamide resin production method KANEKA CORPORATION (JP) 2022-05-10 US disclosed
US-20210277183-A1 POLYAMIDE RESIN, MOLDED BODY, LAMINATE, MEDICAL DEVICE, AND POLYAMIDE RESIN PRODUCTION METHOD KANEKA CORPORATION (JP) 2021-09-09 US disclosed
EP-0789731-B1 SEA WATER-ERODIBLE ANTIFOULING PAINT COMPOSITION HEMPELS SKIBSFARVE FAB J C (DK) 1999-06-09 EP disclosed
EP-0789731-A1 SEA WATER-ERODIBLE ANTIFOULING PAINT COMPOSITION J.C. HEMPEL'S SKIBSFARVE-FABRIK A/S (DK) 1997-08-20 EP disclosed
WO-1996014362-A1 SEA WATER-ERODIBLE ANTIFOULING PAINT COMPOSITION J.C. HEMPEL'S SKIBSFARVE-FABRIK A/S (DK) 1996-05-17 WO disclosed
EP-0517542-B1 Organic electroluminescence devices SUMITOMO CHEMICAL CO (JP) 1995-08-30 EP disclosed
EP-0517542-A1 Organic electroluminescence devices SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1992-12-09 EP disclosed
US-4275184-A HYDROSILATION OF POLYDIMETHYL SILOXANE RHONE-POULENC INDUSTRIES (FR) 1981-06-23 US disclosed
US-4213914-A ADDITION-CONDENSATION COPOLYMERS RHONE-POULENC INDUSTRIES (FR) 1980-07-22 US disclosed
US-4147711-A Ethylenic silicon compounds and thermoplastic elastomers obtained therefrom RHONE-POULENC INDUSTRIES (FR) 1979-04-03 US disclosed
US-4088670-A P-(DIMETHYLVINYLSILYL-METHOXY)-BENZOYL CHLORIDE FROM DIMETHYLVINYL-CHLOROMETHYLSILANE AND A P-HYDROXYBENZOIC ACID RHONE-POULENC INDUSTRIES (FR) 1978-05-09 US disclosed