⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20288631 | 0.84 | — | — | |
| SCHEMBL9973225 | 0.71 | CA1 (0.55) | — | |
| SCHEMBL6854823 | 0.71 | CA1 (0.55) | — | |
| SCHEMBL16120995 | 0.71 | CA1 (0.55) | — | |
| SCHEMBL6857004 | 0.71 | CA1 (0.55) | — | |
| SCHEMBL7643331 | 0.71 | CA1 (0.55) | — | |
| SCHEMBL10583357 | 0.69 | — | — | |
| SCHEMBL7493544 | 0.67 | — | — | |
| SCHEMBL24996798 | 0.67 | — | — | |
| SCHEMBL6982780 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113848681-B | Photosensitive resin composition, dry film and cured film thereof, and printed wiring board using the same | 太阳控股株式会社 | 2024-09-03 | — | — | CN | disclosed |
| CN-115167076-A | Photosensitive resin composition and photosensitive dry film resist laminate | 杭州福斯特电子材料有限公司 | 2022-10-11 | — | — | CN | disclosed |
| WO-2022211082-A1 | PHOTOSENSITIVE FILM LAMINATED BODY, CURED PRODUCT, AND PRINTED CIRCUIT BOARD | 太陽インキ製造株式会社 | 2022-10-06 | — | — | WO | disclosed |
| CN-113848681-A | Photosensitive resin composition, dry film and cured coating film thereof, and printed wiring board using same | 太阳油墨制造株式会社 | 2021-12-28 | — | — | CN | disclosed |
| CN-106716251-B | Photosensitive resin composition, dry film and cured coating film thereof, and printed wiring board using same | 太阳油墨制造株式会社 | 2021-11-05 | — | — | CN | disclosed |
| CN-113614639-A | Laminated structure, cured product, printed circuit board, and electronic component | 太阳油墨制造株式会社 | 2021-11-05 | — | — | CN | disclosed |
| CN-109563222-B | Photocurable resin composition, dry film, cured product, and printed wiring board | 太阳油墨制造株式会社 | 2021-10-15 | — | — | CN | disclosed |
| CN-107129665-B | Curable resin composition | 东京应化工业株式会社 | 2020-11-24 | — | — | CN | disclosed |
| CN-105739239-B | Photocurable/thermosetting resin composition, dry film, cured product, and printed wiring board | 太阳油墨（苏州）有限公司 | 2020-04-03 | — | — | CN | disclosed |
| CN-105467753-B | Photocurable/thermosetting resin composition, dry film, cured product, and printed wiring board | 太阳油墨（苏州）有限公司 | 2020-01-14 | — | — | CN | disclosed |
| US-20120301824-A1 | LAYERED STRUCTURE AND PHOTOSENSITIVE DRY FILM TO BE USED THEREFOR | TAIYO HOLDINGS CO., LTD. (JP) | 2012-11-29 | — | — | US | disclosed |
| US-20120301825-A1 | LAYERED STRUCTURE AND PHOTOSENSITIVE DRY FILM TO BE USED THEREFOR | TAIYO HOLDINGS CO., LTD. (JP) | 2012-11-29 | — | — | US | disclosed |
| US-20120250268-A1 | PHOTOSENSITIVE RESIN COMPOSITION, DRY FILM THEREOF, AND PRINTED WIRING BOARD USING THEM | TAIYO HOLDINGS CO., LTD. (JP) | 2012-10-04 | — | — | US | disclosed |
| US-20120125672-A1 | PHOTOCURABLE RESIN COMPOSITION | TAIYO HOLDINGS CO., LTD. (JP) | 2012-05-24 | — | — | US | disclosed |
| US-20120111620-A1 | PHOTOCURABLE RESIN COMPOSITION | TAIYO HOLDINGS CO., LTD. (JP) | 2012-05-10 | — | — | US | disclosed |
| US-20080085251-A1 | even at a neutral to weakly acidic pH; a lactone or lactam having a mercapto group; with thioglycolic acid, thiolactic acid, cysteine, acetylcysteine, cysteamine, acylcysteamine; | RESONAC CORPORATION (JP) | 2008-04-10 | — | — | US | disclosed |
| EP-1827370-A1 | HAIR PROCESSING AGENT AND METHOD FOR PERMANENT WAVING HAIR | Showa Denko K.K. (JP) | 2007-09-05 | — | — | EP | disclosed |
| WO-2006068276-A1 | HAIR PROCESSING AGENT AND METHOD FOR PERMANENT WAVING HAIR | SHOWA DENKO K.K. (JP) | 2006-06-29 | — | — | WO | disclosed |
| EP-1173430-A1 | ENANTIOMERS OF MERCAPTO LACTONES AND PROCESSES FOR THEIR SYNTHESIS | GLAXO GROUP LIMITED (GB) | 2002-01-23 | — | — | EP | disclosed |
| WO-2000064882-A2 | ENANTIOMERS OF MERCAPTO LACTONES AND PROCESSES FOR THEIR SYNTHESIS | GLAXO GROUP LIMITED (GB) | 2000-11-02 | — | — | WO | disclosed |