Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 2/20 | 0.47 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.45 |
| ▸ | NAAA | Q02083 | 2/20 | 0.44 |
| ▸ | HTT | P42858 | 4/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.36 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | PDK1 | Q15118 | 1/20 | 0.34 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.34 |
| ▸ | PDK3 | Q15120 | 1/20 | 0.34 |
| ▸ | PDK4 | Q16654 | 1/20 | 0.34 |
| ▸ | CHRM3 | P20309 | 4/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | GPR35 | Q9HC97 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | MLNR | O43193 | 1/20 | 0.33 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.33 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.33 |
| ▸ | HTR2A | P28223 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2681186 | 0.98 | EPHX1 (0.44) | EPHX1CYP19A1NAAAHTTCYP2C19 | |
| SCHEMBL27430773 | 0.84 | CYP19A1 (0.44) | EPHX1CYP19A1NAAAHTTCYP2C19 | |
| SCHEMBL19105261 | 0.84 | EPHX1 (0.49) | EPHX1CYP19A1NAAAHTTCYP2C19 | |
| SCHEMBL110743 | 0.83 | EPHX1 (0.45) | EPHX1CYP19A1NAAAHTTCYP2C19 | |
| SCHEMBL13127639 | 0.83 | EPHX1 (0.45) | EPHX1CYP19A1NAAAHTTCYP2C19 | |
| SCHEMBL131561 | 0.81 | EPHX1 (0.50) | EPHX1CYP19A1NAAAHTTCYP2C19 | |
| SCHEMBL14725806 | 0.81 | EPHX1 (0.50) | EPHX1CYP19A1NAAAHTTCYP2C19 | |
| SCHEMBL108478 | 0.81 | EPHX1 (0.50) | EPHX1CYP19A1NAAAHTTCYP2C19 | |
| SCHEMBL3434643 | 0.81 | EPHX1 (0.50) | EPHX1CYP19A1NAAAHTTCYP2C19 | |
| SCHEMBL20388945 | 0.81 | EPHX1 (0.50) | EPHX1CYP19A1NAAAHTTCYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120249995-A1 | RESIST PROTECTIVE FILM MATERIAL AND PATTERN FORMATION METHOD | SHIN-ETSU CHEMICAL CO. LTD. (JP) | 2012-10-04 | — | — | US | disclosed |
| US-8088537-B2 | Resist top coat composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-01-03 | — | — | US | disclosed |
| US-7642034-B2 | Photoresists; (meth)acrylate fluoropolymer which is insoluble in water, dissolvable in aqueous alkaline solution, and immiscible with resist films so that it enables pattern formation by the immersion lithography | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-01-05 | — | — | US | disclosed |
| US-7488567-B2 | Polymer, resist composition and patterning process | PANASONIC CORPORATION (JP) | 2009-02-10 | — | — | US | disclosed |
| US-20070178407-A1 | Polymer, resist protective coating material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-08-02 | — | — | US | disclosed |
| US-20070122736-A1 | RESIST PROTECTIVE FILM MATERIAL AND PATTERN FORMATION METHOD | SHIN-ETSU CHEMICAL CO., LTD. | 2007-05-31 | — | — | US | disclosed |
| US-20070122741-A1 | Resist protective coating material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-31 | — | — | US | disclosed |