SCHEMBL26807594

SCHEMBL26807594

CN1C(C)(C)CC(OC(=O)c2cc(I)ccc2F)CC1(C)C

nearest known ligand 0.39

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
▸ TSHR P16473 3/20 0.38
▸ GAA P10253 2/20 0.38
▸ HTT P42858 1/20 0.38
▸ MAP2K2 P36507 3/20 0.36
▸ MAP2K1 Q02750 3/20 0.36
▸ KMT2A Q03164 2/20 0.36
▸ ALDH1A1 P00352 3/20 0.34
▸ HSD17B10 Q99714 2/20 0.34
▸ ESR1 P03372 1/20 0.34
▸ PTPN1 P18031 2/20 0.33
▸ PTPN2 P17706 1/20 0.33
▸ LMNA P02545 1/20 0.33
▸ CYP3A4 P08684 1/20 0.33
▸ CYP1A2 P05177 1/20 0.33
▸ CYP2C9 P11712 1/20 0.33
▸ CYP2C19 P33261 1/20 0.33
▸ HPGD P15428 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26807779 0.85 MAP2K2 (0.35) TSHRMAP2K2MAP2K1KMT2AALDH1A1
SCHEMBL26807596 0.85 TSHR (0.38) TSHRGAAHTTKMT2AALDH1A1
SCHEMBL26807598 0.81 KMT2A (0.41) TSHRGAAHTTKMT2AALDH1A1
SCHEMBL26427858 0.80 TSHR (0.37) TSHRGAAHTTKMT2AALDH1A1
SCHEMBL11181414 0.79 TSHR (0.44) TSHRGAAHTTKMT2AALDH1A1
SCHEMBL26807591 0.79 PTPN2 (0.55) TSHRGAAHTTKMT2AALDH1A1
SCHEMBL26807585 0.79 TSHR (0.36) TSHRGAAHTTKMT2AALDH1A1
SCHEMBL26807589 0.77 TSHR (0.51) TSHRGAAHTTKMT2AALDH1A1
SCHEMBL26807587 0.76 PTPN2 (0.57) TSHRGAAHTTKMT2AALDH1A1
SCHEMBL18082346 0.76 TSHR (0.40) TSHRGAAHTTKMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11829067-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-28 — — US disclosed
US-11829067-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-28 — — US disclosed
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