Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAP2K2 | P36507 | 11/20 | 0.35 |
| ▸ | MAP2K1 | Q02750 | 11/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26807782 | 0.86 | PTPN2 (0.37) | TSHRPTPN1KMT2A | |
| SCHEMBL26807781 | 0.86 | MEN1 (0.36) | ALDH1A1HPGDHSD17B10MEN1KMT2A | |
| SCHEMBL26807594 | 0.85 | TSHR (0.38) | MAP2K2MAP2K1ALDH1A1HPGDTSHR | |
| SCHEMBL26807785 | 0.82 | KMT2A (0.34) | PTPN1KMT2A | |
| SCHEMBL26807774 | 0.81 | — | — | |
| SCHEMBL26807768 | 0.80 | PTPN2 (0.46) | ALDH1A1TSHRHSD17B10PTPN1KMT2A | |
| SCHEMBL26807771 | 0.80 | TTR (0.34) | — | |
| SCHEMBL26807786 | 0.80 | MGLL (0.34) | ALDH1A1HPGDTSHRHSD17B10MEN1 | |
| SCHEMBL26807767 | 0.78 | TSHR (0.41) | ALDH1A1HPGDTSHRMEN1KMT2A | |
| SCHEMBL26807766 | 0.78 | PTPN2 (0.48) | ALDH1A1TSHRPTPN1MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11829067-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-28 | — | — | US | disclosed |
| US-11829067-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-28 | — | — | US | disclosed |