SCHEMBL26833784

SCHEMBL26833784

BCc1c(B)cc(B)cc1C(=O)OC1CCC(C(=O)OCCS(=O)(=O)O)CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25476350 0.83 — —
SCHEMBL26833786 0.81 — —
SCHEMBL25527943 0.81 — —
SCHEMBL26833794 0.79 — —
SCHEMBL25527820 0.79 — —
SCHEMBL25476279 0.77 — —
SCHEMBL25913777 0.76 — —
SCHEMBL25528065 0.76 — —
SCHEMBL25737137 0.75 — —
SCHEMBL21911813 0.74 HDAC3 (0.30) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11835860-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-05 — — US disclosed
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