SCHEMBL2686789

SCHEMBL2686789

Cl[SiH](Cl)CCC[Si](Cl)(Cl)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7942109 0.88
SCHEMBL2686045 0.88
SCHEMBL9459090 0.73
SCHEMBL9741693 0.71 TSHR (0.31)
SCHEMBL2685444 0.71
SCHEMBL8020972 0.71
SCHEMBL704383 0.71
SCHEMBL25338973 0.68
SCHEMBL4732726 0.68
SCHEMBL4431646 0.68

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024081357-A1 LOW TEMPERATURE SI-CONTAINING FILMS DEPOSITED FROM CHLOROSILANE AND AMINOSILANE REACTIONS VERSUM MATERIALS US, LLC (US) 2024-04-18 WO disclosed
EP-4065746-A1 METHOD FOR DEPOSITING A FILM Versum Materials US, LLC (US) 2022-10-05 EP disclosed
WO-2021133774-A1 METHOD FOR DEPOSITING A FILM VERSUM MATERIALS US, LLC (US) 2021-07-01 WO disclosed
US-20120114544-A1 ORGANIC CHLOROHYDROSILANE AND METHOD FOR PREPARING THEM SAMSUNG FINE CHEMICALS CO., LTD (KR) 2012-05-10 US disclosed
US-7235682-B2 Process for manufacturing organochlorosilanes and dipodal silanes GELEST INC. (US) 2007-06-26 US disclosed