SCHEMBL26868280

SCHEMBL26868280

CC1C2CC(C1C)C(S(=O)(=O)O)C2

nearest known ligand 0.31

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
GRM5 P41594 4/20 0.31
GRM1 Q13255 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26868287 0.80 GRM5 (0.31) GRM5GRM1
SCHEMBL17717468 0.68 MAPT (0.38)
SCHEMBL25689600 0.67 TP53 (0.35) GRM5GRM1
SCHEMBL16316757 0.67 GRM5 (0.30) GRM5GRM1
SCHEMBL9944398 0.67 GRM5 (0.32) GRM5GRM1
SCHEMBL25834633 0.67 GRM5 (0.32) GRM5GRM1
SCHEMBL19072585 0.66 TSHR (0.35) GRM5GRM1
Ammonia Solution, Strong SCHEMBL27991894 0.66
SCHEMBL13826367 0.66 TSHR (0.35) GRM5GRM1
SCHEMBL14567080 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230384674-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-11-30 US disclosed