SCHEMBL2686901

SCHEMBL2686901

N#CCC[SiH](Cl)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2101325 0.81
SCHEMBL715611 0.79
SCHEMBL23908683 0.75
SCHEMBL28562558 0.73 TSHR (0.40)
SCHEMBL5681825 0.67
SCHEMBL4973620 0.65
SCHEMBL19649713 0.65 ALDH1A1 (0.41)
SCHEMBL3810465 0.64
SCHEMBL16037462 0.64 ALDH1A1 (1.00)
SCHEMBL56391 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-10316693-A None JP disclosed
WO-2020235325-A1 SILICON-CONTAINING POLYMER, FILM-FORMING COMPOSITION, METHOD FOR SUPPORTING METAL COMPOUND ON SURFACE OF OBJECT TO BE TREATED, ARTICLE HAVING METAL COMPOUND-SUPPORTING COATING FILM, AND METHOD FOR PRODUCING SILICON-CONTAINING POLYMER 東京応化工業株式会社 (JP) 2020-11-26 WO disclosed
CN-102498117-A Organic Chlorosilane And Method For Preparing Same SAMSUNG FINE CHEMICALS CO LTD 2012-06-13 CN disclosed
US-20120114544-A1 ORGANIC CHLOROHYDROSILANE AND METHOD FOR PREPARING THEM SAMSUNG FINE CHEMICALS CO., LTD (KR) 2012-05-10 US disclosed
JP-H10316693-A SYNTHESIS OF ORGANIC SILICON DICHLORIDE HAVING CYANO GROUP AT BETA-POSITION KANEGAFUCHI CHEM IND CO LTD 1998-12-02 JP disclosed
EP-0525997-B1 Catalysts for addition of silicon hydrides to alpha, beta-unsaturated olefinic nitriles DOW CORNING (US) 1996-08-21 EP disclosed
US-5126468-A Diamine and copper or copper compound DOW CORNING CORPORATION (US) 1992-06-30 US disclosed
US-4097511-A Organofunctional-silicon materials GENERAL ELECTRIC COMPANY (US) 1978-06-27 US disclosed