SCHEMBL2688620

SCHEMBL2688620

CC1OC1C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3078568 0.97 LMNA (0.32)
SCHEMBL340895 0.97 LMNA (0.32)
SCHEMBL1471023 0.92
SCHEMBL17003997 0.82
SCHEMBL8157781 0.80 LMNA (0.32)
SCHEMBL20494293 0.80 LMNA (0.32)
SCHEMBL1463182 0.79
SCHEMBL10324826 0.76
SCHEMBL20495266 0.76
SCHEMBL4559380 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118909278-A Preparation method of polyvinyl alcohol film and polyvinyl alcohol film 贵州省材料产业技术研究院 2024-11-08 CN claimed
US-8936744-B2 Photocurable resin composition containing fluorine and method for producing a resin mold using same DONGJIN SEMICHEM CO., LTD. (KR) 2015-01-20 US claimed
US-20120114906-A1 PHOTOCURABLE RESIN COMPOSITION CONTAINING FLUORINE AND METHOD FOR PRODUCING A RESIN MOLD USING SAME DONGJIN SEMICHEM CO., LTD (KR) 2012-05-10 US claimed
US-20250297145-A1 SURFACE TOLERANT ADHESIVE HUNTSMAN ADVANCED MATERIALS AMERICAS LLC 2025-09-25 US disclosed
EP-4486841-A2 SURFACE TOLERANT ADHESIVE Huntsman Advanced Materials Americas LLC (US) 2025-01-08 EP disclosed
CN-118922510-A Surface-tolerant adhesive 亨斯迈先进材料美国有限责任公司 2024-11-08 CN disclosed
CN-118909278-A Preparation method of polyvinyl alcohol film and polyvinyl alcohol film 贵州省材料产业技术研究院 2024-11-08 CN disclosed
CN-114890874-B Fluorine-containing surfactant and preparation method thereof 浙江大学衢州研究院 2024-07-16 CN disclosed
WO-2023183119-A9 SURFACE TOLERANT ADHESIVE HUNTSMAN ADVANCED MATERIALS AMERICAS LLC (US) 2023-11-16 WO disclosed
WO-2023183119-A2 SURFACE TOLERANT ADHESIVE HUNTSMAN ADVANCED MATERIALS AMERICAS LLC (US) 2023-09-28 WO disclosed
CN-114890874-A Fluorine-containing surfactant and preparation method thereof 浙江大学衢州研究院 2022-08-12 CN disclosed
US-8936744-B2 Photocurable resin composition containing fluorine and method for producing a resin mold using same DONGJIN SEMICHEM CO., LTD. (KR) 2015-01-20 US disclosed
US-20120114906-A1 PHOTOCURABLE RESIN COMPOSITION CONTAINING FLUORINE AND METHOD FOR PRODUCING A RESIN MOLD USING SAME DONGJIN SEMICHEM CO., LTD (KR) 2012-05-10 US disclosed