SCHEMBL2689429

SCHEMBL2689429

CO[Si](C)(C)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1023909 0.80
SCHEMBL304984 0.76
SCHEMBL28106566 0.74
SCHEMBL74926 0.74
SCHEMBL30404213 0.74
SCHEMBL7791671 0.73
SCHEMBL13453126 0.73
SCHEMBL15514421 0.73
SCHEMBL16015353 0.73
SCHEMBL16021867 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 103 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025057923-A1 METHOD FOR PRODUCING ZIRCONIUM OXIDE POWDER, AND ZIRCONIUM OXIDE POWDER 堺化学工業株式会社 2025-03-20 WO disclosed
WO-2024214603-A1 ACTIVE ENERGY RAY-CURABLE COMPOSITION AND CURED PRODUCT THEREOF 三洋化成工業株式会社 2024-10-17 WO disclosed
CN-116917417-A Zirconium element-containing resin composition 堺化学工业株式会社 2023-10-20 CN disclosed
US-20230244145-A1 SILICON-CONTAINING MONOMER MIXTURE, POLYSILOXANE, RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, PRODUCTION METHOD FOR CURED FILM, PATTERNED CURED FILM, AND PRODUCTION METHOD FOR PATTERNED CURED FILM CENTRAL GLASS COMPANY, LIMITED (JP) 2023-08-03 US disclosed
CN-115304913-A Reinforced flame-retardant hypophosphite/nylon composite material with high glowing filament ignition temperature and preparation method thereof 横店集团得邦工程塑料有限公司 2022-11-08 CN disclosed
WO-2022181302-A1 ZIRCONIUM ELEMENT-CONTAINING RESIN COMPOSITION 堺化学工業株式会社 2022-09-01 WO disclosed
CN-105980307-B Silica particles, resin composition containing the same, and use thereof 株式会社日本触媒 2020-03-27 CN disclosed
US-9972756-B2 Method for producing semiconductor light-emitting device SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2018-05-15 US disclosed
US-9954152-B2 Method for producing semiconductor light-emitting device SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2018-04-24 US disclosed
US-9893250-B1 Light emitting device having silicone resin-based sealing member NICHIA CORPORATION (JP) 2018-02-13 US disclosed
EP-1544257-A2 Process for producing inorganic oxide organosol NISSAN CHEMICAL INDUSTRIES, LIMITED (JP) 2005-06-22 EP disclosed
EP-1142894-B1 Volatile precursors for deposition of metals and metal-containing films AIR PROD & CHEM (US) 2005-01-12 EP disclosed
US-6818783-B2 HOMOLOGOUS EIGHT MEMBERED RING COMPOUNDS HAVING A METAL, SUCH AS COPPER, REVERSIBLY BOUND IN THE RING AND CONTAINING CARBON, NITROGEN, SILICON AND/OR OTHER METALS. AIR PRODUCTS AND CHEMICALS, INC. 2004-11-16 US disclosed
US-20030135061-A1 Volatile precursors for deposition of metals and metal-containing films VERSUM MATERIALS US, LLC 2003-07-17 US disclosed
US-20020013487-A1 Volatile precursors for deposition of metals and metal-containing films VERSUM MATERIALS US, LLC 2002-01-31 US disclosed
EP-0698632-B1 Process for preparing organosiloxane terminated with silanol group SHINETSU CHEMICAL CO (JP) 2001-11-21 EP disclosed
EP-1142894-A2 Volatile precursors for deposition of metals and metal-containing films AIR PRODUCTS AND CHEMICALS, INC. (US) 2001-10-10 EP disclosed
US-5576408-A Process for preparing low molecular weight organosiloxane terminated with silanol group SHIN-ETSU CHEMICAL CO., LTD. (JP) 1996-11-19 US disclosed
EP-0698632-A1 Process for preparing organosiloxane terminated with silanol group SHIN-ETSU CHEMICAL CO., LTD. (JP) 1996-02-28 EP disclosed
US-4183928-A Haloarylmalonamidooxacephalosporins SHIONOGI AND CO., LTD. (JP) 1980-01-15 US disclosed