⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10325523 | 0.83 | — | — | |
| SCHEMBL8610654 | 0.80 | — | — | |
| SCHEMBL31225049 | 0.77 | — | — | |
| SCHEMBL1463856 | 0.77 | — | — | |
| SCHEMBL3078572 | 0.74 | LMNA (0.31) | — | |
| SCHEMBL691829 | 0.74 | LMNA (0.31) | — | |
| SCHEMBL20494686 | 0.74 | LMNA (0.31) | — | |
| SCHEMBL8607849 | 0.70 | — | — | |
| SCHEMBL8612548 | 0.70 | — | — | |
| SCHEMBL1444058 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8936744-B2 | Photocurable resin composition containing fluorine and method for producing a resin mold using same | DONGJIN SEMICHEM CO., LTD. (KR) | 2015-01-20 | — | — | US | claimed |
| US-20120114906-A1 | PHOTOCURABLE RESIN COMPOSITION CONTAINING FLUORINE AND METHOD FOR PRODUCING A RESIN MOLD USING SAME | DONGJIN SEMICHEM CO., LTD (KR) | 2012-05-10 | — | — | US | claimed |
| US-20250297145-A1 | SURFACE TOLERANT ADHESIVE | HUNTSMAN ADVANCED MATERIALS AMERICAS LLC | 2025-09-25 | — | — | US | disclosed |
| EP-4486841-A2 | SURFACE TOLERANT ADHESIVE | Huntsman Advanced Materials Americas LLC (US) | 2025-01-08 | — | — | EP | disclosed |
| WO-2023183119-A9 | SURFACE TOLERANT ADHESIVE | HUNTSMAN ADVANCED MATERIALS AMERICAS LLC (US) | 2023-11-16 | — | — | WO | disclosed |
| WO-2023183119-A2 | SURFACE TOLERANT ADHESIVE | HUNTSMAN ADVANCED MATERIALS AMERICAS LLC (US) | 2023-09-28 | — | — | WO | disclosed |
| US-8936744-B2 | Photocurable resin composition containing fluorine and method for producing a resin mold using same | DONGJIN SEMICHEM CO., LTD. (KR) | 2015-01-20 | — | — | US | disclosed |
| US-20120114906-A1 | PHOTOCURABLE RESIN COMPOSITION CONTAINING FLUORINE AND METHOD FOR PRODUCING A RESIN MOLD USING SAME | DONGJIN SEMICHEM CO., LTD (KR) | 2012-05-10 | — | — | US | disclosed |