⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10879862 | 1.00 | — | — | |
| SCHEMBL4417478 | 1.00 | — | — | |
| SCHEMBL14797833 | 0.97 | — | — | |
| SCHEMBL2986168 | 0.88 | — | — | |
| SCHEMBL3176852 | 0.77 | LMNA (0.38) | — | |
| SCHEMBL6328126 | 0.77 | LMNA (0.38) | — | |
| SCHEMBL7936584 | 0.77 | LMNA (0.38) | — | |
| SCHEMBL4362927 | 0.76 | — | — | |
| SCHEMBL2695678 | 0.76 | — | — | |
| SCHEMBL1376848 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8936744-B2 | Photocurable resin composition containing fluorine and method for producing a resin mold using same | DONGJIN SEMICHEM CO., LTD. (KR) | 2015-01-20 | — | — | US | claimed |
| US-20120114906-A1 | PHOTOCURABLE RESIN COMPOSITION CONTAINING FLUORINE AND METHOD FOR PRODUCING A RESIN MOLD USING SAME | DONGJIN SEMICHEM CO., LTD (KR) | 2012-05-10 | — | — | US | claimed |
| US-20250297145-A1 | SURFACE TOLERANT ADHESIVE | HUNTSMAN ADVANCED MATERIALS AMERICAS LLC | 2025-09-25 | — | — | US | disclosed |
| EP-4486841-A2 | SURFACE TOLERANT ADHESIVE | Huntsman Advanced Materials Americas LLC (US) | 2025-01-08 | — | — | EP | disclosed |
| WO-2023183119-A9 | SURFACE TOLERANT ADHESIVE | HUNTSMAN ADVANCED MATERIALS AMERICAS LLC (US) | 2023-11-16 | — | — | WO | disclosed |
| WO-2023183119-A2 | SURFACE TOLERANT ADHESIVE | HUNTSMAN ADVANCED MATERIALS AMERICAS LLC (US) | 2023-09-28 | — | — | WO | disclosed |
| US-9346920-B2 | Water-repellent and oil-repellent composition, and water-repellent film formed by using the composition | CANON FINETECH INC. (JP) | 2016-05-24 | — | — | US | disclosed |
| EP-2947114-A1 | Surface modification method and surface-modified elastic body | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2015-11-25 | — | — | EP | disclosed |
| US-20150299469-A1 | WATER-REPELLENT AND OIL-REPELLENT COMPOSITION, AND WATER-REPELLENT FILM FORMED BY USING THE COMPOSITION | CANON FINETECH NISCA INC. (JP) | 2015-10-22 | — | — | US | disclosed |
| EP-2692785-B1 | SURFACE MODIFICATION METHOD AND SURFACE-MODIFIED ELASTIC BODY | SUMITOMO RUBBER IND (JP) | 2015-10-07 | — | — | EP | disclosed |
| US-8969427-B2 | Surface modification method and surface-modified elastic body | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2015-03-03 | — | — | US | disclosed |
| US-8936744-B2 | Photocurable resin composition containing fluorine and method for producing a resin mold using same | DONGJIN SEMICHEM CO., LTD. (KR) | 2015-01-20 | — | — | US | disclosed |
| US-20140039084-A1 | SURFACE MODIFICATION METHOD AND SURFACE-MODIFIED ELASTIC BODY | SUMITOMO RUBBER INDUSTRIES, LTD. (JP) | 2014-02-06 | — | — | US | disclosed |
| EP-2692785-A1 | Surface Modification Method and Surface-Modified Elastic Body | Sumitomo Rubber Industries, Ltd. (JP) | 2014-02-05 | — | — | EP | disclosed |
| US-20120114906-A1 | PHOTOCURABLE RESIN COMPOSITION CONTAINING FLUORINE AND METHOD FOR PRODUCING A RESIN MOLD USING SAME | DONGJIN SEMICHEM CO., LTD (KR) | 2012-05-10 | — | — | US | disclosed |