SCHEMBL26939733

SCHEMBL26939733

CCC(OC(=O)C(C)(C)C(=O)O)OC1CCCCC1

nearest known ligand 0.34

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 1/20 0.34
NAAA Q02083 1/20 0.32
CTSS P25774 1/20 0.32
CTSK P43235 1/20 0.32
CYP19A1 P11511 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26939721 0.98 EPHX1 (0.32) EPHX1NAAA
SCHEMBL16590977 0.84 HMGCR (0.35) EPHX1NAAACYP19A1
SCHEMBL17833871 0.82 HMGCR (0.36) EPHX1NAAACYP19A1
SCHEMBL26939728 0.80 CYP19A1 (0.36) EPHX1CTSSCTSKCYP19A1
SCHEMBL26939735 0.79 CYP19A1 (0.33) CTSSCTSKCYP19A1
SCHEMBL23015556 0.78 EPHX1 (0.32) EPHX1
SCHEMBL26939734 0.78 CYP19A1 (0.32) CYP19A1
SCHEMBL26939725 0.77 CYP19A1 (0.31) CYP19A1
SCHEMBL26939723 0.76 CYP19A1 (0.30) CYP19A1
SCHEMBL26939739 0.75 HSD11B1 (0.34) CTSSCTSK

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230400766-A1 ONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-14 US disclosed
US-20230400766-A1 ONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-14 US disclosed