SCHEMBL26939740

SCHEMBL26939740

CC(C)C(OC(=O)C(C)(C)C(=O)O)OC1C2CC3CC(C2)CC1C3

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26939738 0.85 HSD11B1 (0.33) HSD11B1
SCHEMBL26939741 0.84 HSD11B1 (0.32) HSD11B1
SCHEMBL9924473 0.82 HSD11B1 (0.30) HSD11B1
SCHEMBL26939739 0.80 HSD11B1 (0.34) HSD11B1
SCHEMBL19261121 0.80
SCHEMBL23502920 0.79
SCHEMBL26299276 0.79 TSHR (0.39) HSD11B1
SCHEMBL26939533 0.77 EPHX2 (0.34) HSD11B1
SCHEMBL26939723 0.75 CYP19A1 (0.30)
SCHEMBL26939745 0.74 NPC1 (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230400766-A1 ONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-14 US disclosed
US-20230400766-A1 ONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-14 US disclosed