SCHEMBL26939773

SCHEMBL26939773

CC(C)(OC(=O)C1(C(=O)O)CCCC1)C1CCCCC1

nearest known ligand 0.36

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
MAPT P10636 1/20 0.32
EPHX1 P07099 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26939772 0.98
SCHEMBL26939771 0.95
SCHEMBL26939770 0.93
SCHEMBL23365365 0.80
SCHEMBL23293553 0.79 CYP2C19 (0.32)
SCHEMBL26939956 0.78 CYP2C19 (0.33) MAPT
SCHEMBL26939897 0.78 RBP4 (0.35)
SCHEMBL7884001 0.78 CYP2C19 (0.31)
SCHEMBL4829842 0.77 NPSR1 (0.31)
SCHEMBL27559873 0.75 EPHX1 (0.36) EPHX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230400766-A1 ONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-14 US disclosed
US-20230400766-A1 ONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-14 US disclosed