SCHEMBL2694699

SCHEMBL2694699

CCCCC(C)c1ccccc1O[Sn](CCCC)(CCCC)Oc1ccccc1C(C)CCCC

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
ATM Q13315 1/20 0.34
PPARG P37231 3/20 0.33
PTGES O14684 1/20 0.33
ALOX5 P09917 1/20 0.33
PPARA Q07869 1/20 0.33
CYP1A2 P05177 1/20 0.33
CYP2C9 P11712 1/20 0.33
CYP2C19 P33261 1/20 0.33
TSHR P16473 2/20 0.32
NISCH Q9Y2I1 1/20 0.32
HTT P42858 1/20 0.31
MEN1 O00255 1/20 0.31
RECQL P46063 1/20 0.31
KMT2A Q03164 1/20 0.31
CYSLTR2 Q9NS75 2/20 0.30
CYSLTR1 Q9Y271 2/20 0.30
DHFR P00374 1/20 0.30
EGFR P00533 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2697595 0.94 PPARG (0.36) KDM4EL3MBTL1ATMPPARGPTGES
SCHEMBL2695744 0.94 KDM4E (0.35) KDM4EL3MBTL1ATMPPARGPTGES
SCHEMBL2697634 0.89 KDM4E (0.44) KDM4EL3MBTL1ATMPPARGCYP1A2
SCHEMBL2696386 0.88 PPARG (0.38) KDM4EL3MBTL1ATMPPARGPPARA
SCHEMBL2694306 0.86 CYP1A2 (0.39) L3MBTL1PPARGPTGESALOX5PPARA
SCHEMBL2697201 0.84 KDM4E (0.36) KDM4EL3MBTL1ATMPPARGPTGES
SCHEMBL2695767 0.84 KDM4E (0.42) KDM4EL3MBTL1ATMPPARGCYP1A2
SCHEMBL2694697 0.81 CYP1A2 (0.34) KDM4EL3MBTL1ATMPPARGCYP1A2
SCHEMBL2696730 0.81 DHFR (0.33) KDM4EL3MBTL1PPARGCYP1A2CYP2C9
SCHEMBL2697117 0.81 CYP1A2 (0.32) KDM4EL3MBTL1ATMCYP1A2CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8168812-B2 Process for producing alkyl tin alkoxide compound and process for producing carbonic acid ester using said compound ASAHI KASEI CHEMICALS CORPORATION (JP) 2012-05-01 US disclosed