SCHEMBL270481

SCHEMBL270481

CC(C#N)=C(C#N)C#N

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11880052 0.79
SCHEMBL9961321 0.79
SCHEMBL11512484 0.79
SCHEMBL2454582 0.72
SCHEMBL11273556 0.72
SCHEMBL732522 0.69
SCHEMBL8082824 0.69
SCHEMBL3191000 0.69
SCHEMBL28464454 0.69 CA1 (0.40)
SCHEMBL26931 0.69 CA1 (0.40)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 58 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3627608-B1 POLYMER ELECTROLYTE FOR SECONDARY BATTERY AND LITHIUM SECONDARY BATTERY COMPRISING THE SAME LG ENERGY SOLUTION LTD (KR) 2023-08-30 EP disclosed
WO-2023008248-A1 REACTIVE MATERIAL AND THIN FILM PRODUCTION METHOD 株式会社ADEKA 2023-02-02 WO disclosed
US-10685844-B2 Hardmask composition, method of forming pattern by using the hardmask composition, and hardmask formed using the hardmask composition SAMSUNG ELECTRONICS CO., LTD. (KR) 2020-06-16 US disclosed
EP-3480224-A1 ELECTRO-OPTIC POLYMER National Institute of Information and Communications Technology (JP) 2019-05-08 EP disclosed
US-20190035635-A1 HARDMASK COMPOSITION, METHOD OF FORMING PATTERN BY USING THE HARDMASK COMPOSITION, AND HARDMASK FORMED USING THE HARDMASK COMPOSITION SAMSUNG ELECTRONICS CO., LTD. (KR) 2019-01-31 US disclosed
US-20160351342-A1 HOLE TRANSPORTING AND LIGHT ABSORBING MATERIAL FOR SOLID STATE SOLAR CELLS UNIVERSITAT ULM (DE) 2016-12-01 US disclosed
US-20160351342-A1 HOLE TRANSPORTING AND LIGHT ABSORBING MATERIAL FOR SOLID STATE SOLAR CELLS UNIVERSITAT ULM (DE) 2016-12-01 US disclosed
US-9488755-B2 Second-order nonlinear optical compound and nonlinear optical element comprising the same NATIONAL INSTITUTE OF INFORMATION AND COMMUNICATIONS TECHNOLOGY (JP) 2016-11-08 US disclosed
US-20160318889-A1 SECOND-ORDER NONLINEAR OPTICAL COMPOUND AND NONLINEAR OPTICAL ELEMENT COMPRISING THE SAME NAT INST INF & COMM TECH (JP) 2016-11-03 US disclosed
WO-2015114521-A1 HOLE TRANSPORTING AND LIGHT ABSORBING MATERIAL FOR SOLID STATE SOLAR CELLS ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (EPFL) (CH) 2015-08-06 WO disclosed
WO-2007134984-A1 HETEROAROYL-SUBSTITUTED ALANINES WITH A HERBICIDAL ACTION BASF SE (DE) 2007-11-29 WO disclosed
WO-2007134971-A1 BENZOYL-SUBSTITUTED ALANINES BASF SE (DE) 2007-11-29 WO disclosed
WO-2007093529-A2 HETEROAROYL-SUBSTITUTED ALANINES BASF SE (DE) 2007-08-23 WO disclosed
WO-2007093539-A2 BENZOYL-SUBSTITUTED ALANINES BASF SE (DE) 2007-08-23 WO disclosed
EP-1394158-B1 Thiophene derivatives and optical elements using the same FUJIFILM CORP (JP) 2007-03-21 EP disclosed
US-7186358-B2 electron accepting group such as naphthoquinone or 1,4-dihydro-1,4-dioxo-2,3-Naphthalenedicarbonitrile, that is bound to the polymer to induce or enhance the charge carrier mobility or electroconductivity of said polymers, used in optical, electrooptical or electronic apparatus MERCK PATENT GESELLSCHAFT (DE) 2007-03-06 US disclosed
WO-2006125688-A1 BENZOYL-SUBSTITUTED SERINE AMIDES BASF AKTIENGESELLSCHAFT (DE) 2006-11-30 WO disclosed
WO-2006125687-A1 HETEROAROYL-SUBSTITUTED SERINE AMIDES BASF AKTIENGESELLSCHAFT (DE) 2006-11-30 WO disclosed
US-5665706-A NERVE GROWTH FACTOR AND 2-AMINO-1,1,3-TRICYANO-1-PROPENE EAST CAROLINA UNIVERSITY (US) 1997-09-09 US disclosed
EP-0767809-A2 CURE-INDICATING MOLDING AND COATING COMPOSITION MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1997-04-16 EP disclosed